(5-Methyl-2-bicyclo[2.2.1]heptanyl) acetate | 16745-68-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: (5-Methyl-2-bicyclo[2.2.1]heptanyl) acetate
• CAS: 16745-68-9；60362-86-9；60362-89-2
• 化学式: C₁₀H₁₆O₂
• 分子量: 168.236
• InChiKey: FCVZQCVXEVHEFP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  (5-Methyl-2-bicyclo[2.2.1]heptanyl) acetate 在 盐酸 、 氢氧化钾 作用下， 以 乙醇 为溶剂， 反应 12.0h， 生成 5-endo-Methyl-2-norbornanon-tosylhydrazon
  参考文献：
  名称：

  Kirmse, Wolfgang; Hartmann, Marianne; Siegfried, Rainer, Chemische Berichte, 1981, vol. 114, # 5, p. 1793 - 1808

  摘要：

  DOI：
• 作为产物：
  描述：

  5-降冰烯-2-基乙酸酯 在 platinum on activated charcoal 、 铜 、 锌 氢气 作用下， 生成 (5-Methyl-2-bicyclo[2.2.1]heptanyl) acetate
  参考文献：
  名称：

  Kirmse, Wolfgang; Hartmann, Marianne; Siegfried, Rainer, Chemische Berichte, 1981, vol. 114, # 5, p. 1793 - 1808

  摘要：

  DOI：

文献信息

• CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
  申请人：Ohsawa Youichi

  公开号：US20130034813A1

  公开（公告）日：2013-02-07

  A chemically amplified positive resist composition comprising (A) a sulfonium salt of 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionic acid, (B) an acid generator, (C) a base resin, and (D) an organic solvent is suited for ArF immersion lithography. The carboxylic acid sulfonium salt is highly hydrophobic and little leached out in immersion water. By virtue of controlled acid diffusion, a pattern profile with high resolution can be constructed.

  一种化学增感正型光刻胶组合物，包括（A）三氟甲基-3,3,3-三氟-2-羟基-2-丙酸磺酸盐，（B）酸发生剂，（C）碱性树脂和（D）有机溶剂，适用于ArF浸没光刻。羧酸磺酸盐具有高度疏水性，在浸没水中几乎不溶出。通过控制酸扩散，可以构建具有高分辨率的图案轮廓。
• Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing
  申请人：FUJIFILM Corporation

  公开号：US10928727B2

  公开（公告）日：2021-02-23

  According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.

  根据本发明，提供了一种光敏或辐射敏感树脂组合物，其中包括在酸的作用下在碱显影剂中的溶解速率会降低的化合物（A）、疏水性树脂（B）和具有芳香环的树脂（C），以及使用该组合物的薄膜、掩膜坯、图案形成方法和电子设备制造方法。
• POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：HARADA Yuji

  公开号：US20090208873A1

  公开（公告）日：2009-08-20

  A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects.
• Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used
  申请人：Terui Yoshiharu

  公开号：US20110065857A1

  公开（公告）日：2011-03-17

  There is provided a fluorine-containing polymer having a repeating unit of the general formula (2) and produced by homopolymerization or copolymerization with an other polymerizable double bond-containing monomer. In the formula, W represents a linking group; R 1 each independently represents a perfluoroalkyl group; Q represents a unit structure formed by cleavage of a double bond of a polymerizable double bond-containing group; and M + represents a hydrogen cation, a metal ion or a quaternary ammonium ion. There is also provided an antistatic agent using the above fluorine-containing polymer such that the antistatic agent can impart antistatic performance to an article stably over a long time and show excellent transparency.
• RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS
  申请人：Suka Yuuki

  公开号：US20130084517A1

  公开（公告）日：2013-04-04

  A protective film-forming composition comprising a polymer comprising fluorinated alcohol units of the structure: —C(CF 3 ) 2 OR 1 wherein R 1 is H or a monovalent hydrocarbon group and having a Mw of 1,000-500,000 is applied onto a resist film to form a protective film thereon. The protective film-forming composition has high water repellent and water slip performance. The protective film exhibits barrier properties to water and prevents any resist components from being leached out in water.