5-endo-Methyl-2-endo-norbornanol | 99881-01-3

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 5-endo-Methyl-2-endo-norbornanol
• 英文别名: 5-endo-Methyl-2-exo-norbornanol；5-exo-Methyl-2-exo-norbornanol；5-Methylbicyclo[2.2.1]heptan-2-ol
• CAS: 99881-01-3
• 化学式: C₈H₁₄O
• 分子量: 126.199
• InChiKey: GITHCSQJYVBMHZ-UHFFFAOYSA-N

物化性质

• 沸点：
  90 °C(Press: 14 Torr)
• 密度：
  1.032±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.5
• 重原子数：
  9
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  5-降冰烯-2-基乙酸酯 在 platinum on activated charcoal 、 铜 、 锌 氢气 作用下， 生成 5-endo-Methyl-2-endo-norbornanol
  参考文献：
  名称：

  Kirmse, Wolfgang; Hartmann, Marianne; Siegfried, Rainer, Chemische Berichte, 1981, vol. 114, # 5, p. 1793 - 1808

  摘要：

  DOI：

文献信息

• CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
  申请人：Ohsawa Youichi

  公开号：US20130034813A1

  公开（公告）日：2013-02-07

  A chemically amplified positive resist composition comprising (A) a sulfonium salt of 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionic acid, (B) an acid generator, (C) a base resin, and (D) an organic solvent is suited for ArF immersion lithography. The carboxylic acid sulfonium salt is highly hydrophobic and little leached out in immersion water. By virtue of controlled acid diffusion, a pattern profile with high resolution can be constructed.

  一种化学增感正型光刻胶组合物，包括（A）三氟甲基-3,3,3-三氟-2-羟基-2-丙酸磺酸盐，（B）酸发生剂，（C）碱性树脂和（D）有机溶剂，适用于ArF浸没光刻。羧酸磺酸盐具有高度疏水性，在浸没水中几乎不溶出。通过控制酸扩散，可以构建具有高分辨率的图案轮廓。
• Solvent-controlled additions of organotitanium reagents to olefinic double bonds
  作者：Etienne Moret、Manfred Schlosser

  DOI：10.1016/s0040-4039(00)88920-0

  日期：1985.1

  Under carefully chosen working conditions (solvent, temperature), methyltitanium reagents smoothly convert homoallyl alcohols having a terminal double-bond into (E)-3-penten-l-ols whereas non-terminal 3-alken-l-ols afford 4-methyl-branched derivatives with configurational inversion of the chain (Z → E; E → Z), stereoselectivities being better than 99%.

  在精心选择的工作条件（溶剂，温度）下，甲基钛试剂可将具有末端双键的均烯丙基醇平稳地转化为（E）-3-戊烯-1-醇，而非末端的3-烯丙基-1-醇可提供4-甲基-链支链的衍生物，具有链的构型反转（Z→E； E→Z），立体选择性优于99％。
• Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
  申请人：——

  公开号：US20030113658A1

  公开（公告）日：2003-06-19

  A novel photoacid generator containing a structure of the following formula (I), 1 wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z 1 and Z 2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

  提供一种新型光酸发生剂，其含有以下式(I)的结构，其中R是一种具有50重量％或以下氟含量，硝基，氰基或氢原子的一价有机基团，Z1和Z2分别是氟原子或具有1-10个碳原子的线性或支链全氟烷基团。当用于化学增感辐射敏感树脂组成物中时，该光酸发生剂表现出高透明度，相对高的可燃性和无生物积累，并产生具有高酸度，高沸点，适度短的扩散长度在抗蚀涂层中，并且对掩模图案密度的依赖性低的酸。
• Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
  申请人：——

  公开号：US20040067436A1

  公开（公告）日：2004-04-08

  Polymerizable silicon-containing compounds of formula (1) wherein R 1 is hydrogen, halogen or monovalent organic group are polymerized into polymers. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching, and thus lends itself to micropatterning for the fabrication of VLSIs. 1

  公式（1）中R1为氢、卤素或一价有机基团的可聚合硅含量化合物可以聚合成聚合物。以该聚合物为基础树脂的抗蚀剂组合物对高能辐射敏感，在小于300纳米的波长下具有优异的灵敏度和分辨率，同时具有高抗氧等离子体刻蚀性能，因此适用于微图案制造VLSI。
• SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1679314A1

  公开（公告）日：2006-07-12

  A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided. The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10. The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.

  本发明提供了一种适用于作为化学放大抗蚀剂的树脂成分的新型聚硅氧烷，该抗蚀剂具有特别优异的 I-D 偏压和焦深（DOF）等性能；一种可用作合成该聚硅氧烷的原料的新型硅烷化合物；以及一种包含该聚硅氧烷的辐射敏感树脂组合物。 硅烷化合物如下式（I）所示、 而聚硅氧烷具有下式（1）所示的结构单元、 其中 R 是烷基，R1 和 R2 分别代表氟原子、低级烷基或低级氟烷基，n 是 0 或 1，k 是 1 或 2，i 是 0 至 10 的整数。 辐射敏感树脂组合物包括聚硅氧烷和光酸发生器。