Hassarajani, S. A.; Dhotare, B.; Chattopadhyay, A., Indian Journal of Chemistry - Section B Organic and Medicinal Chemistry, 1998, vol. 37, # 1, p. 80 - 81
1,5-Dicarbonyl-Verbindungen durch Michael-Addition deprotonierter Enamine und Allylamine an 2-(<i>N</i>-Methylanilino)-acrylnitril
作者:Hubertus Ahlbrecht、Manfred Dietz、Lothar Weber
DOI:10.1055/s-1987-27904
日期:——
1,5-Dicarbonyl Compounds via Michael-Addition of Deprotonated Enamines and Allylamines to 2-(N-Methylanilino) acrylonitrile A new method for the synthesis of the title compounds by a onepot, three component, coupling reaction is described. Is consists of the reaction of a homoenolate anion and an enol cation equivalent with subsequent alkylation of an acyl-anion equivalent. Hence the methodology of Umpolung is used in a threefold manner within the reaction sequence.
Preparation and Reactions of Diorganozincs from Dienic Silyl Enol Ethers
作者:A. Devasagayaraj、L. Schwink、P. Knochel
DOI:10.1021/jo00116a013
日期:1995.6
The hydroboration of the dienic silyl enol ethers 1a-d with Et(2)BH produces organoboranes which are readily converted under mild conditions by a treatment with Et(2)Zn to the corresponding dialkylzincs 2a-d. These organometallics react after transmetalation with CuCN . 2LiCl with various electrophiles affording polyfunctional silyl enol ethers of type 4. In the presence of the chiral catalyst (1R,2R)-bis(trifluoromethanesulfonamido)cyclohexane 6, the dialkylzinc 2b was added to various aldehydes leading to hydroxy silyl enol ethers of type 8 in satisfactory yields (45-77%) and excellent enantioselectivities (85 to >96 % ee). The chiral products 8 can be oxidatively cyclized using t-BuOOH and catalytic amounts of VO(acac)(2) furnishing trisubstituted tetrahydropyrans like 9a,b with high diastereoselectivity. An iodoalkoxylation of 8 affords after HI elimination and Jones oxidation the unsaturated valerolactone 13.
AHLBRECHT H.; DIETZ M.; WEBER L., SYNTHESIS,(1987) N 3, 251-254
作者:AHLBRECHT H.、 DIETZ M.、 WEBER L.
DOI:——
日期:——
POLISHING COMPOSITION
申请人:FUJIMI INCORPORATED
公开号:US20150069016A1
公开(公告)日:2015-03-12
There is provided a polishing composition capable of suppressing formation of a stepped portion caused by etching of a surface of a polishing object including a portion containing a group IV material when the polishing object is polished. The present invention relates to a polishing composition for polishing of a polishing object including a portion that contains a group IV material, and the polishing composition contains an oxidizing agent and an anticorrosive agent. Preferably, the anticorrosive agent includes at least one selected from the group consisting of compounds in which two or more carbonyl groups contained in a molecule are bonded through a carbon atom in the molecule. To be more specific, preferably, the anticorrosive agent includes at least one selected from the group consisting of a 1,3-diketone compound, a 1,4-diketone compound, and a triketone compound.