Two series of new ribonucleoside 3′‐phosphoramidites (see 36–42) carrying the photolabile [2‐(2‐nitrophenyl)propoxy]carbonyl group at the 5′‐O‐position were synthesized and characterized as monomeric building blocks for photolithographic syntheses of RNA chips. Base protection was achieved in the well‐known manner by the 2‐(4‐nitrophenyl)ethyl (npe) and the [2‐(4‐nitrophenyl)ethoxy]carbonyl (npeoc)
两个系列的新的
核糖核苷3'-亚
磷酰胺(参见36 - 42)承载光不稳定[2-(2-
硝基苯基)丙
氧基]羰基处的5'- Ò位上被合成和表征作为用于光刻合成单体结构单元RNA芯片。通过2-(4-
硝基苯基)乙基(npe)和[2-(4-
硝基苯基)乙
氧基]羰基(npeoc)基团以众所周知的方式实现了碱保护。
碳水化合物部分还带有2' - O-(四
氢-
4-甲氧基-2 H-
吡喃-4-基)基团以阻断2'-OH功能。