2-(trifluoromethyl)bicyclo<2.2.1>heptan-2-ol | 118143-25-2

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-(trifluoromethyl)bicyclo<2.2.1>heptan-2-ol
• 英文别名: 2-(Trifluoromethyl)bicyclo[2.2.1]heptan-2-ol
• CAS: 118143-25-2
• 化学式: C₈H₁₁F₃O
• 分子量: 180.17
• InChiKey: KQYCGMBEIDNWKA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2-(trifluoromethyl)bicyclo<2.2.1>heptan-2-ol 在 potassium hydride 作用下， 以 四氢呋喃 为溶剂， 生成 O-[2-(trifluoromethyl)-2-bicyclo[2.2.1]heptanyl] methylsulfanylmethanethioate
  参考文献：
  名称：

  Radical allylation of trifluoromethylated xanthates: use of DEAD for removing the allyltributyltin excess

  摘要：

  Radical allylation of trifluoromethylated xanthates allows the preparation of quaternary carbon centers bearing the trifluoromethyl group. An excess of the allyltributyltin reagent must be used in order to achieve satisfactory yields of the adducts. The excess of reagent could be conveniently removed by the use of diethylazodicarboxylate (DEAD). (C) 2001 Elsevier Science Ltd. All rights reserved.

  DOI：

  10.1016/s0040-4039(00)02135-3
• 作为产物：
  描述：

  在 盐酸 作用下， 生成 2-(trifluoromethyl)bicyclo<2.2.1>heptan-2-ol
  参考文献：
  名称：

  Preparation of trifluoromethyl and other perfluoroalkyl compounds with (perfluoroalkyl)trimethylsilanes

  摘要：

  The preparation of a variety of novel perfluoroalkyl-substituted compounds in high yields using easily prepared (perfluoroalkyl)trimethylsilanes (1a-c) is described. (Trifluoromethyl)-, (pentafluoroethyl)-, and (heptafluoropropyl)trimethylsilane, 1a-c, respectively, react readily with carbonyl compounds, such as aldehydes and ketones, by a fluoride-initiated catalytic process. Fluoride-initiated addition of 1 to a carbonyl group generates an oxyanionic species which then further catalyzes the reaction. Even enolizable carbonyl compounds react cleanly under the reaction conditions. A study of the scope of the reactivity of 1a toward other carbonyl groups in esters, lactones and an acid chloride was also carried out. Thus 1a reacts cleanly with five- and six-membered ring lactones. However, unactivated esters do not react under the reaction conditions. The acid chloride reacts with 1a to give a mixture of products.

  DOI：

  10.1021/jo00003a017

文献信息

• BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120141938A1

  公开（公告）日：2012-06-07

  A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.

  一种化学放大型光刻胶组合物，包括基础聚合物、酸发生剂和胺淬灭剂，后者为β-丙氨酸、γ-氨基丁酸或5-氨基戊酸的衍生物，具有一个被酸不稳定基团所取代的羧基，这种组合物在曝光前后具有高对比度的碱性溶解速率，并且能够形成高分辨率、最小粗糙度和宽焦深度的良好图案轮廓。
• Cesium Fluoride Catalyzed Trifluoromethylation of Esters, Aldehydes, and Ketones with (Trifluoromethyl)trimethylsilane
  作者：Rajendra P. Singh、Ganfeng Cao、Robert L. Kirchmeier、Jean'ne M. Shreeve

  DOI：10.1021/jo982494c

  日期：1999.4.1

  low reactivity of carboxylic esters toward (trifluoromethyl)trimethylsilane (TMS-CF(3)) was investigated. A universal cesium fluoride catalyzed procedure for nucleophilic trifluoromethylation was developed. At room temperature (25 degrees C), with catalytic amounts of cesium fluoride, carboxylic esters were found to react to give the silyl ether intermediates, which afforded the trifluoromethyl ketones

  研究了羧酸酯对（三氟甲基）三甲基硅烷（TMS-CF（3））的低反应性。建立了通用的氟化铯催化亲核三氟甲基化反应的方法。在室温（25摄氏度）下，催化量的氟化铯被发现与羧酸酯反应生成甲硅烷基醚中间体，在水解后得到三氟甲基酮。磺酸酯，亚磺酸酯和亚硒酸酯也显示出良好的反应活性，得到了新颖的三氟甲基化化合物。三氟甲基化方法也适用于醛和酮，将其转化为三氟甲基甲硅烷基醚中间体，并在酸水解后以优异的产率得到三氟甲基化的醇。乙二醇二甲醚用作固体或高沸点底物的溶剂，
• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200223796A1

  公开（公告）日：2020-07-16

  A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.

  提供了一种化学增感剂组合物，其中包括式（1）的新型离子盐作为PAG。当使用KrF或ArF准分子激光、EB或EUV进行光刻工艺处理时，该抗蚀组合物具有高灵敏度、减少酸扩散，并在曝光宽度、MEF和LWR方面得到改善。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140045123A1

  公开（公告）日：2014-02-13

  A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.

  一种聚合物，包括由具有支链烷基的萜酸酯单体衍生的重复单元，用于形成抗蚀组合物。在经过曝光、PEB和有机溶剂显影处理后，抗蚀组合物在溶解对比度方面得到改善。
• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。