2-(2-methoxy-ethoxymethoxy)-ethylamine

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-(2-methoxy-ethoxymethoxy)-ethylamine
• 英文别名: Formaldehyd-(2-methoxy-aethyl)-(2-amin-aethyl)-acetal；2-(2-Methoxy-aethoxymethoxy)-aethylamin；O-(2-methoxyethoxymethyl)ethanolamine；2-(2-methoxyethoxymethoxy)ethanamine
• 化学式: C₆H₁₅NO₃
• 分子量: 149.19
• InChiKey: WKVFXPOUGPVAQN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.1
• 重原子数：
  10
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  53.7
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2-(2-methoxy-ethoxymethoxy)-ethylamine 、 Cbz-L-叔亮氨酸 在 1,2-二氯乙烷 作用下， 以 乙醚 、 乙醇 、 正己烷 、 五氟苯酚 、 N,N-二甲基甲酰胺 为溶剂， 以1.79 g (67%)的产率得到N-Benzyloxycarbonyl-L-tert-leucine-N-2-(2-methoxy-ethoxymethoxy)ethylamide
  参考文献：
  名称：

  Metalloproteinase inhibitors

  摘要：

  通式（I）的化合物主要特征在于R4是聚醚基团，是水溶性基质金属蛋白酶抑制剂。

  公开号：

  US05866717A1
• 作为产物：
  描述：

  N-Benzyloxycarbonyl-O-(2-methoxyethoxymethyl)ethanolamine 在 钯 氢气 作用下， 以 乙醇 、 乙酸乙酯 为溶剂， 反应 26.0h， 生成 2-(2-methoxy-ethoxymethoxy)-ethylamine
  参考文献：
  名称：

  Metalloproteinase inhibitors

  摘要：

  通式为（I）的化合物，其主要特征在于R4是聚醚基团，是水溶性基质金属蛋白酶抑制剂。 ## STR1 ##

  公开号：

  US05866717A1

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170176855A1

  公开（公告）日：2017-06-22

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R b1 represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y b1 represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V b1 represents a fluorinated alkylene group; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m). R b1 —Y b1 —V b1 —SO 3 − (M m+ ) 1/m (b1)

  一种抗蚀组合物，在暴露后产生酸，并在酸的作用下在显影溶液中表现出改变的溶解度，包括在酸的作用下在显影溶液中表现出改变的溶解度的基组分（A）和在暴露后产生酸的酸生成组分（B），其中酸生成组分（B）包括下面所示的一般式（b1）表示的化合物（B1）（在一般式（b1）中，Rb1代表具有7至30个碳原子并含有极性基团的桥环脂环基团；Yb1代表具有9个或更多碳原子的线性烃基团，可能具有一个取代基，但不包括由芳香烃基团和乙烯基组成的至少一种成员；Vb1代表氟代烷基烯基团；m表示1或更多的整数；Mm+代表价数为m的有机阳离子）。Rb1—Yb1—Vb1—SO3−(Mm+)1/m（b1）
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200174365A1

  公开（公告）日：2020-06-04

  A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R bd1 to R bd3 each independently represent an aryl group which may have a substituent, provided that one or more of R bd1 to R bd3 are aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X − represents a counter anion.

  一种抗蚀组合物，含有基础材料组分，其在显影溶液中的溶解性由酸的作用和由化合物代表的公式（bd1）改变；在公式中，Rbd1到Rbd3各自独立地代表可能具有取代基的芳基，前提是Rbd1到Rbd3中的一个或多个是可能具有取代基的芳基，而这些芳基中至少有一个可能具有取代基的氟代烷基与公式中与硫原子相结合的碳原子相邻的碳原子结合，可能具有取代基的氟代烷基的总数为2或更多；X−代表一个对离子。
• [EN] MATRIPTASE 2 INHIBITORS AND USES THEREOF<br/>[FR] INHIBITEURS DE MATRIPTASE 2 ET LEURS UTILISATIONS
  申请人：DISC MEDICINE INC

  公开号：WO2020072580A1

  公开（公告）日：2020-04-09

  The present invention provides compounds for inhibiting matriptase 2, or a mutant thereof, and compositions and methods of use thereof.

  本发明提供了用于抑制matriptase 2或其突变体的化合物，以及它们的组合物和使用方法。
• Resist composition, method of forming resist pattern, novel compound and acid generator
  申请人：Kawaue Akiya

  公开号：US20100196820A1

  公开（公告）日：2010-08-05

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R 5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q 5 represents a single bond or a divalent linking group).

  一种抗蚀组合物，包括在酸处理下在碱性显影溶液中表现出溶解性变化的基础组分（A）和在暴露后生成酸的酸生成组分（B），酸生成组分（B）包括含有由通式（I）表示的阳离子基团的酸生成剂（B1）（在该式中，R5代表氢原子或具有1至30个碳原子的有可能具有取代基的有机基团；Q5代表单键或二价连接基团）。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20180149973A1

  公开（公告）日：2018-05-31

  A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R 01 to R 014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R 01 to R 014 may be mutually bonded to form a ring structure, provided that at least two of R 01 to R 014 are mutually bonded to form a ring structure, and at least one of R 01 to R 014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m).

  一种抗蚀组合物，包括在酸的作用下在显影溶液中表现出改变溶解度的基础组分，以及一种具有阴离子基团和阳离子基团的化合物（B1），其由一般式（b1）表示（其中R01至R014分别独立地表示氢原子或可能具有取代基的碳氢基团，或者R01至R014中的两个或两个以上可能相互键合形成环结构，前提是至少两个R01至R014相互键合形成环结构，至少一个R01至R014具有阴离子基团，整体上阴离子基团形成带有价数n的阴离子；n表示1或更多的整数；表示1或更多的整数；Mm+表示具有价数m的有机阳离子）。