MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20150322027A1
公开(公告)日:2015-11-12
A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.
3-chloro-3-methyl-2-butanone in ethanolic KOH at room temperature gave 3,3-dimethyl-5-aryltetrahydro-2-furanone as a major product. The reaction can be tentatively explained by the combination of Favorskii rearrangement and aldol reaction.