1-methyl-2,4-diphenyl-1H-imidazole | 109277-31-8

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑类
• 英文名称: 1-methyl-2,4-diphenyl-1H-imidazole
• 英文别名: 1-methyl-2,4-diphenylimidazole；1-methyl-2,4-diphenyl-1H-imidazole；1-Methyl-2,4-diphenyl-1H-imidazol；Imidazole, 1-methyl-2,4-diphenyl-
• CAS: 109277-31-8
• 化学式: C₁₆H₁₄N₂
• 分子量: 234.301
• InChiKey: OMJWFVNSAREUFS-UHFFFAOYSA-N

物化性质

• 熔点：
  117-117.6 °C
• 沸点：
  432.5±38.0 °C(Predicted)
• 密度：
  1.06±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.06
• 拓扑面积：
  17.8
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1-methyl-2,4-diphenyl-1H-imidazole 在 P(C₆H₅)3 作用下， 以 水 、 丙酮 为溶剂， 生成
  参考文献：
  名称：

  Suarez, Antonio; Vila, Jose Manuel; Pereira, Maria Teresa, Synthesis and Reactivity in Inorganic and Metal-Organic Chemistry, 1990, vol. 20, p. 1425 - 1440

  摘要：

  DOI：
• 作为产物：
  描述：

  苯甲腈 在 吡啶 、 copper(II) choride dihydrate 、 氧气 、 sodium hydride 、 sodium carbonate 作用下， 以 二甲基亚砜 、 1,2-二氯乙烷 、 mineral oil 为溶剂， 70.0 ℃ 、101.33 kPa 条件下， 反应 49.0h， 生成 1-methyl-2,4-diphenyl-1H-imidazole
  参考文献：
  名称：

  Am催化的铜催化末端炔烃氧化胺化反应：1,2,4-三取代的咪唑的合成

  摘要：

  已经开发了使用am和末端炔烃的铜催化的1,2,4-三取代的咪唑的高效铜催化合成。总体而言，该氧化过程涉及Na 2 CO 3，吡啶，催化量的CuCl 2 ·2H 2 O和氧气（1个大气压），由炔烃的区域选择性加重反应组成，从而可以适度地合成出各种咪唑。产量。

  DOI：

  10.1021/ol400560m

文献信息

• Catalyst-Controlled Regioselective Suzuki Couplings at Both Positions of Dihaloimidazoles, Dihalooxazoles, and Dihalothiazoles
  作者：Neil A. Strotman、Harry R. Chobanian、Jiafang He、Yan Guo、Peter G. Dormer、Christina M. Jones、Janelle E. Steves

  DOI：10.1021/jo100148x

  日期：2010.3.5

  dihaloazoles can be monoarylated at a single C−X bond with high selectivity via Suzuki coupling. By changing the palladium catalyst employed, the selectivity can be switched for some dihaloazoles, allowing for Suzuki coupling at the other, traditionally less reactive C−X bond. These conditions are applicable to coupling of a wide variety of aryl-, heteroaryl-, cyclopropyl-, and vinylboronic acids with

  各种二卤代唑可以通过Suzuki偶联在单个C-X键上以高选择性单芳基化。通过改变所用的钯催化剂，可以切换一些二卤代唑的选择性，从而使Suzuki偶联在另一个传统上反应性较小的C-X键上。这些条件适用于以高选择性偶联各种芳基，杂芳基，环丙基和乙烯基硼酸，并能够以模块化的方式快速构建各种不同的二芳基唑阵列。
• Positive photoresist composition for exposure to far ultraviolet ray
  申请人：——

  公开号：US20010008739A1

  公开（公告）日：2001-07-19

  A positive photoresist composition for exposure to a far ultraviolet ray which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which contains a repeating unit corresponding to hydroxystyrene and solubility of which increases in an alkaline developing solution by the action of an acid, and (C) (1) at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether propionate, and (2) at least one solvent selected from the group consisting of propylene glycol monomethyl ether and ethoxyethyl propionate. The positive photoresist composition of the present invention is suitable for exposure to a far ultraviolet ray, particularly a KrF excimer laser beam, is improved in line edge roughness and micro grain, is excellent in uniformity of carting on a substrate and has less particles in its resist solution.

  一种用于曝光远紫外线的正性光阻组合物，包括（A）一种在光致发酵剂或辐射照射下生成酸的化合物，（B）一种含有对应于羟基苯乙烯的重复单元且在碱性显影液中酸催化下溶解度增加的树脂，以及（C）（1）至少一种从丙二醇单甲醚醋酸酯和丙二醇单甲醚丙酸酯组成的溶剂，和（2）至少一种从丙二醇单甲醚和乙氧基乙酸丙酯组成的溶剂。本发明的正性光阻组合物适用于远紫外线曝光，特别是KrF准分子激光束，具有改善的线边粗糙度和微粒子，均匀性好，其光阻溶液中的颗粒较少。
• Positive photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：US20020172886A1

  公开（公告）日：2002-11-21

  A positive photoresist composition comprising the components of: (a) a resin which decomposes by the action of an acid, thereby having an increased solubility in an alkali developer; and (b) a compound which is represented by the formula (1) and generates an acid by exposure to active rays or radiation, and a compound which is represented by the formula (2) and generates an acid by exposure to active rays or radiation.

  一种正向光致变色胶组合物，包括以下组成部分：(a)一种树脂，通过酸的作用分解，从而在碱性显影剂中具有增加的溶解度；和(b)一种化合物，其由公式(1)表示，并通过暴露于活性光线或辐射而产生酸，以及一种由公式(2)表示的化合物，通过暴露于活性光线或辐射而产生酸。
• Derivatives of 3-methyl-imidazo [4,5-c]pyrazole having therapeutic activity and a process for the preparation theref
  申请人：CAMILLO CORVI S.p.A.

  公开号：EP0190457A1

  公开（公告）日：1986-08-13

  The present invention concerns novel derivatives of 3-methyl-imidazo [4,5-c] pyrazole of formula Said compounds have therapeutical activity, in particular said compounds are endowed with an intense CNS depressant activity. The invention furthermore concerns a process for preparing the compounds of formula (I).

  本发明涉及式 3-甲基咪唑并[4,5-c]吡唑的新型衍生物。 本发明还涉及一种制备式 (I) 化合物的工艺。
• Positive resist composition
  申请人：Fuji Photo Film Co., Ltd.

  公开号：EP1457822A2

  公开（公告）日：2004-09-15

  A positive resist composition comprising (A) a resin having a specific structure and capable of decomposing under action of an acid to increase solubility in an alkali developer, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.

  一种阳离子抗蚀剂组合物，包括：(A) 具有特定结构并能在酸作用下分解以增加在碱显影液中溶解度的树脂；(B) 能在辐照射线或辐射照射下生成酸的化合物。