THIOL-CONTAINING COMPOUNDS FOR THE REMOVAL OF ELEMENTS FROM CONTAMINATED MILIEU AND METHODS OF USE
申请人:Haley Boyd E.
公开号:US20110076246A1
公开(公告)日:2011-03-31
Sulfur-containing ligands and methods of their utilization for binding metals and/or main group elements and removing them from fluids, solids, gases and/or tissues are disclosed. The ligands are of the general structure:
where R
1
comprises benzene, pyridine, pyridin-4-one, naphthalene, anthracene, phenanthrene or alkyl groups, R
2
comprises hydrogen, alkyls, aryls, a carboxyl group, carboxylate esters, organic groups or biological groups, R
3
comprises alkyls, aryls, a carboxyl group, carboxylate esters, organic groups or biological groups, X comprises hydrogen, lithium, sodium, potassium, rubidium, cesium, francium, alkyls, aryls, a carboxyl group, carboxylate esters, thiophosphate, N-acetyl cysteine, mercaptoacetic acid, mercaptopropionic acid, thiolsalicylate, organic groups or biological groups, n independently equals 1-10, m=1-6, Y comprises hydrogen, polymers, silicas or silica supported substrates, and Z comprises hydrogen, alkyls, aryls, a carboxyl group, carboxylate esters, a hydroxyl group, NH
2
, HSO
3
, halogens, a carbonyl group, organic groups, biological groups, polymers, silicas or silica supported substrates.
含硫配体及其在结合金属和/或主族元素并从流体、固体、气体和/或组织中去除它们的方法已被披露。这些配体具有一般结构:其中R1包括苯、吡啶、吡啶-4-酮、萘、蒽、菲或烷基,R2包括氢、烷基、芳基、羧基、羧酸酯、有机基团或生物基团,R3包括烷基、芳基、羧基、羧酸酯、有机基团或生物基团,X包括氢、锂、钠、钾、铷、铯、钫、烷基、芳基、羧基、羧酸酯、硫代磷酸酯、N-乙酰半胱氨酸、巯基乙酸、巯基丙酸、巯基水杨酸盐、有机基团或生物基团,n独立地等于1-10,m=1-6,Y包括氢、聚合物、硅或硅支撑基质,Z包括氢、烷基、芳基、羧基、羧酸酯、羟基、NH2、HSO3、卤素、羰基、有机基团、生物基团、聚合物、硅或硅支撑基质。