Precursors to fluoroalkanol-containing olefin monomers and associated methods of synthesis and use
申请人:Breyta Gregory
公开号:US20050124827A1
公开(公告)日:2005-06-09
The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
convenient procedure for the synthesis of homoallylic alcohols from carbonyl compounds and allylboranes is described. Allyl-, 2-methylallyl-, crotyl- and 3,3-dimethylallyl(dialkyl)boranes, as well as diallyl(alkyl)boranes and derivatives of 3-allyl- and 3-metallyl-3-borabicyclo[3.3.1]non-6-ene are effective reagents for allylation of carbonyl compounds (aldehydes, ketones, esters, carboxylic acids and others)
Precursors to Fluoroalkanol-Containing Olefin Monomers, and Associated Methods of Synthesis and Use
申请人:Breyta Gregory
公开号:US20080033200A1
公开(公告)日:2008-02-07
The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules
申请人:Allen Robert David
公开号:US20080233517A1
公开(公告)日:2008-09-25
The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
Negative resists based on acid-catalyzed elimination of polar molecules
申请人:Allen David Robert
公开号:US20070259274A1
公开(公告)日:2007-11-08
The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.