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2-(Methoxymethoxy)-1,7,7-trimethylbicyclo[2.2.1]heptane | 127938-47-0

中文名称
——
中文别名
——
英文名称
2-(Methoxymethoxy)-1,7,7-trimethylbicyclo[2.2.1]heptane
英文别名
——
2-(Methoxymethoxy)-1,7,7-trimethylbicyclo[2.2.1]heptane化学式
CAS
127938-47-0
化学式
C12H22O2
mdl
——
分子量
198.305
InChiKey
ZULIMZAJTYTXKQ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.2
  • 重原子数:
    14
  • 可旋转键数:
    3
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    18.5
  • 氢给体数:
    0
  • 氢受体数:
    2

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为产物:
    描述:
    二甲醇缩甲醛borneolmelamine trisulfonic acid 作用下, 以 氯仿 为溶剂, 反应 1.0h, 以80%的产率得到2-(Methoxymethoxy)-1,7,7-trimethylbicyclo[2.2.1]heptane
    参考文献:
    名称:
    三聚氰胺三磺酸 (MTSA):一种用于醇类化学选择性甲氧基甲基化的新型高效催化剂
    摘要:
    三聚氰胺三磺酸很容易通过三聚氰胺与纯氯磺酸反应制备,能够有效地催化醇与二甲氧基甲烷(DMM)的化学选择性甲氧基甲基化。所有反应均在温和且完全非均相的反应条件下以良好至高产率进行。
    DOI:
    10.1080/00397910903026707
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文献信息

  • A mild and efficient method for the methoxymethylation and acetylation of alcohols promoted by benzyltriphenylphosphonium tribromide
    作者:Farhad Shirini、Gholam Hossein Imanzadeh、Seyyed Ali Reza Mousazadeh、Iraj Mohammadpoor-Baltork、Masoumeh Abedin
    DOI:10.1016/j.cclet.2010.04.031
    日期:2010.10
    Abstract A mild and efficient method for the conversion of alcohols to their corresponding methoxymethyl ethers and acetates using benzyltriphenylphosphonium tribromide (BTPTB) as catalyst is described. All reactions were performed under completely heterogeneous reaction conditions in good to high yields.
    摘要描述了一种温和有效的方法,以三化苄基三苯基phosph(BTPTB)为催化剂将醇转化为其相应的甲氧基甲基醚和乙酸酯。所有反应均在完全异质的反应条件下以高至高收率进行。
  • SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US20170305848A1
    公开(公告)日:2017-10-26
    A novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator including the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, R 1 and R 2 each independently represent the group that is represented by formula (a2) or an alkyl group that may be substituted by a halogen atom, R 1 and R 2 are bonded to each other and may form a ring with the sulfur atom within the formula, R 3 is the group represented by formula (a3) or the group represented by formula (a4), A 1 represents S or the like, X − represents a monovalent anion, and R 1 and R 2 are not both an alkyl group which may be substituted with a halogen atom. In formulas (a2) to (a4), the ring Z 1 represents an aromatic hydrocarbon ring, R 4 , R 6 , R 9 , and R 10 each represents a specific monovalent group, R 5 , R 7 , and R 8 each represents a specific divalent group, A 2 and A 3 each represents S or the like, m1 represents an integer of 0 or more, and n1 and n2 each represent 0 or more.
    一种对活性能量射线具有高敏感度的新型磺鎓盐,包括该磺鎓盐的光酸发生剂以及含有该光酸发生剂的光敏组合物。该磺鎓盐由公式(a1)表示。在该公式中,R1和R2分别表示由公式(a2)表示的基团或可能被卤素原子取代的烷基基团,R1和R2彼此相连并且可以与公式中的原子形成环,R3表示由公式(a3)表示的基团或由公式(a4)表示的基团,A1表示S或类似物,X-表示一价阴离子,且R1和R2不同时为可能被卤素原子取代的烷基基团。在公式(a2)到(a4)中,环Z1表示芳香族碳氢环,R4、R6、R9和R10各自表示特定的一价基团,R5、R7和R8各自表示特定的二价基团,A2和A3各自表示S或类似物,m1表示0或更多的整数,n1和n2各自表示0或更多。
  • (Meth)Acrylate, Polymer and Resist Composition
    申请人:Ootake Atsushi
    公开号:US20080003529A1
    公开(公告)日:2008-01-03
    A polymer contains a constituent unit having a specific acetal skeleton. This polymer is able to be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography, or the like.
  • (METH)ACRYLATE, POLYMER AND RESIST COMPOSITION
    申请人:Ootake Atsushi
    公开号:US20090226851A1
    公开(公告)日:2009-09-10
    A polymer contains a constituent unit having a specific acetal skeleton. This polymer is able to be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography, or the like.
  • CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE
    申请人:Kashiwamura Takashi
    公开号:US20100266952A1
    公开(公告)日:2010-10-21
    A cyclic compound shown by the following formula (I): wherein, of two R 1 s which are present on the same aromatic ring, one is a group shown by R 3 , and the other is a dissolution controlling group; R 3 s are independently hydrogen, a substituted or unsubstituted linear aliphatic hydrocarbon group having 1 to 20 carbon atoms, a substituted or unsubstituted branched aliphatic hydrocarbon group having 3 to 12 carbon atoms, a substituted or unsubstituted cyclic aliphatic hydrocarbon group having 3 to 20 carbon atoms, a substituted or unsubstituted aromatic group having 6 to 10 carbon atoms, an alkoxyalkyl group, a silyl group or a group formed by combining these groups with a divalent group.
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