exo-6-hydroxymethyl-exo-3-oxatricyclo<3.2.1.0^2,4>octane | 3306-94-3

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: exo-6-hydroxymethyl-exo-3-oxatricyclo<3.2.1.0^2,4>octane
• 英文别名: endo-6-hydroxymethyl-endo-6-oxatricyclo<3.2.1.0^2,4>octane；3-Oxatricyclo[3.2.1.02,4]octane-6-methanol；3-oxatricyclo[3.2.1.02,4]octan-6-ylmethanol
• CAS: 3306-94-3
• 化学式: C₈H₁₂O₂
• 分子量: 140.182
• InChiKey: UMYCCRNFNCCUFN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  32.8
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  endo-6-methoxycarbonyl-endo-3-oxatricyclo<3.2.1.0^2,4>octane 在 lithium aluminium tetrahydride 作用下， 以 乙醚 为溶剂， 以86.7%的产率得到exo-6-hydroxymethyl-exo-3-oxatricyclo<3.2.1.0^2,4>octane
  参考文献：
  名称：

  Kas'yan, L. I.; Zefirov, N. S.; Gnedenkov, L. Yu., Journal of Organic Chemistry USSR (English Translation), 1982, p. 1047 - 1051

  摘要：

  DOI：
• 作为试剂：
  描述：

  5-降冰片烯-2-甲醇 、 间氯过氧苯甲酸 在 苯甲酸 、 Disodium;sulfite 、 碳酸氢钠 、 exo-6-hydroxymethyl-exo-3-oxatricyclo<3.2.1.0^2,4>octane 、 甲苯 、 硫酸 作用下， 以 二氯甲烷 为溶剂， 反应 3.0h， 以to yield 10.1 g of 2-hydroxy-4-oxatricyclo[4.2.1.03,7]nonane的产率得到6-hydroxy-3,5-methanocyclopentatetrahydrofuran
  参考文献：
  名称：

  Compound, polymer, resist composition, and patterning process

  摘要：

  本发明公开了一种聚合物，其中至少包含由以下一般式（1）表示的重复单元，并且该聚合物作为基础树脂包含在抗蚀剂组合物中，特别是化学增感抗蚀剂组合物。可以提供一种抗蚀剂组合物，其在实际使用水平上具有蚀刻抗性，并且在与基板的附着性和与显影剂的亲和性方面表现出色，并且具有远比传统抗蚀剂组合物优异的灵敏度和分辨率，其中在显影时膨胀较小，特别适用于使用高能光束作为光源的光刻技术，特别是提供一种化学增感抗蚀剂组合物。

  公开号：

  US07169541B2

文献信息

• Novel compound, polymer, resist composition, and patterning process
  申请人：Hasegawa Koji

  公开号：US20050014092A1

  公开（公告）日：2005-01-20

  There is disclosed a polymer containing at least a repeating unit represented by the following general formula (1), and the resist composition containing the polymer as a base resin, especially a chemically amplified resist composition. There can be provided a resist composition which has etching resistance in a practical use level, and is excellent in an adhesion property with a substrate and an affinity with a developer, and has a sensitivity and resolving power which is far excellent compared with a conventional one, wherein swelling is small at the time of development, especially for photolithography which uses a high-energy beam as a light source, and especially be provided a chemically amplified resist composition.

  本发明公开了一种聚合物，其至少包含由下述通式（1）表示的重复单元，并且该聚合物作为基础树脂含于抗蚀剂组成物中，特别是化学增感抗蚀剂组成物中。本发明可提供一种在实际使用水平上具有蚀刻抗性、与基板具有优异的粘附性和与显影剂具有亲和性，并且具有远优于传统抗蚀剂的感度和分辨率的抗蚀剂组成物，在开发时膨胀小，特别适用于使用高能光束作为光源的光刻技术，特别是化学增感抗蚀剂组成物。
• EPOXYSILANES, PROCESSES FOR THEIR MANUFACTURE AND CURABLE COMPOSITIONS CONTAINING SAME
  申请人：Momentive Performance Materials Inc.

  公开号：EP2137198B1

  公开（公告）日：2016-05-18
• Epoxysilanes, processes for their manufacture and curable compositions containing same
  申请人：Su Shiu-Chin H.

  公开号：US20080221238A1

  公开（公告）日：2008-09-11

  Epoxysilanes are provided which contain at least one epoxy group, at least one hydrolyzable silyl group and one or more linkages containing a carbonyl group bonded to heteroatoms selected from the group consisting of oxygen, sulfur and nitrogen with at least one such heteroatom being nitrogen, there being no such linkage in which both an epoxy group and hydrolyzable silyl group are directly or indirectly bonded to the same nitrogen heteroatom in the linkage.
• METHOD FOR PRODUCING EPOXY COMPOUND
  申请人：Arakawa Chemical Industries, Ltd.

  公开号：US20140073806A1

  公开（公告）日：2014-03-13

  To provide a method for producing an epoxy compound having fewer residual quaternary salt compound by removing the quaternary salt compound from an organic solution containing an epoxy compound and the quaternary salt compound. A method for producing an epoxy compound comprising the following step 1, step 2, and step 3: step 1: a step in which in a mixture liquid containing an olefin compound, an aqueous hydrogen peroxide solution, a quaternary salt compound, a heteropoly acid, and an organic solvent, the olefin compound is subjected to the oxidation reaction to obtain an organic solution (A) containing an epoxy compound, step 2: a step in which an aqueous inorganic alkali solution is allowed to contact with the organic solution (A) to obtain an organic solution (B) containing the epoxy compound, and step 3: a step in which an acidic aqueous solution containing a polymer having at least one functional group selected from the group consisting of a carboxyl group and a sulfonic acid group is allowed to contact with the organic solution (B) to obtain an organic solution (C) containing the epoxy compound.
• US7169541B2
  申请人：——

  公开号：US7169541B2

  公开（公告）日：2007-01-30