三(6-重氮-5-氧代-5,6-二氢-1-萘磺酸)-4-苯甲酰基-1,2,3-苯三(酚)酯 | 5610-94-6

• 物质功能分类: 有机原料 - 重氮、偶氮或氧化偶氮化合物
• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 三(6-重氮-5-氧代-5,6-二氢-1-萘磺酸)-4-苯甲酰基-1,2,3-苯三(酚)酯
• 中文别名: 2,3,4-三羟基二苯甲酮三(1,2-萘醌-2-叠氮代-5-磺酸酯)；三(6-重氮-5-氧代-5,6-二氢-1-萘磺酸)-
• 英文名称: 2,3,4-tris<2-diazo-1-oxonaphthalen-5-ylsulfonyloxy>benzophenone
• 英文别名: 2,3,4-tri(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone；1-Naphthalenesulfonic acid, 6-diazo-5,6-dihydro-5-oxo-, 4-benzoyl-1,2,3-benzenetriyl ester；5-[4-benzoyl-2,3-bis[(6-diazonio-5-oxidonaphthalen-1-yl)sulfonyloxy]phenoxy]sulfonyl-2-diazonionaphthalen-1-olate
• CAS: 5610-94-6
• 化学式: C₄₃H₂₂N₆O₁₃S₃
• 分子量: 926.878
• InChiKey: IYBMFZHGMIRLPI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  13.2
• 重原子数：
  65
• 可旋转键数：
  11
• 环数：
  8.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  326
• 氢给体数：
  0
• 氢受体数：
  16

反应信息

• 作为反应物：
  描述：

  三(6-重氮-5-氧代-5,6-二氢-1-萘磺酸)-4-苯甲酰基-1,2,3-苯三(酚)酯 以 N,N-二甲基甲酰胺 为溶剂， 生成 2,3,4-tri(carboxy-indene-7-sulfonyl-oxy)-benzophenone 、 2-(3-carboxy-imdene-7-sulfonyl-oxy)-3,4-di(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone
  参考文献：
  名称：

  Chromophore specific photoreactivity in 2,3,4-Tri(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone

  摘要：

  Different electronic structures for the three 1,2-naphthoquinone-2-diazide (NQD) chromophores in 2,3,4-tri (1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone were detected using H-1 NMR spectroscopy. The NQD substituent in the o-position of the benzophenone is influenced by intramolecular through space interactions with the benzophenone part of the molecule. The change in the electronic structure is the reason for the obtained different photoreactivity of the o-NQD chromophore compared with m-NQD and p-NQD. The relative quantum yields of photolysis are 0.3 (o-NQD) and 0.9/1.0 (m-NQD/p-NQD).

  DOI：

  10.1002/prac.19943360805
• 作为产物：
  描述：

  2,3,4-三羟基二苯甲酮 、 2-重氮-1-萘酚-5-磺酰氯 在 苄基三乙基氯化铵 、 sodium carbonate 作用下， 以 二氯甲烷 、 水 为溶剂， 生成 三(6-重氮-5-氧代-5,6-二氢-1-萘磺酸)-4-苯甲酰基-1,2,3-苯三(酚)酯
  参考文献：
  名称：

  Chromophore specific photoreactivity in 2,3,4-Tri(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone

  摘要：

  Different electronic structures for the three 1,2-naphthoquinone-2-diazide (NQD) chromophores in 2,3,4-tri (1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone were detected using H-1 NMR spectroscopy. The NQD substituent in the o-position of the benzophenone is influenced by intramolecular through space interactions with the benzophenone part of the molecule. The change in the electronic structure is the reason for the obtained different photoreactivity of the o-NQD chromophore compared with m-NQD and p-NQD. The relative quantum yields of photolysis are 0.3 (o-NQD) and 0.9/1.0 (m-NQD/p-NQD).

  DOI：

  10.1002/prac.19943360805

文献信息

• [EN] 7-ARYL-3,9-DIAZABICYCLO(3.3.1)NON-6-ENE DERIVATIVES AND THEIR USE AS RENIN INHIBITORS IN THE TREATMENT OF HYPERTENSION, CARDIOVASCULAR OR RENAL DISEASES<br/>[FR] DERIVES DE 7-ARYL-3,9-DIAZABICYCLO(3.3.1)NON-6-ENE ET LEUR UTILISATION EN TANT QU'INHIBITEURS DE RENINE DANS LE TRAITEMENT DE L'HYPERTENSION, DE MALADIES CARDIOVASCULAIRES OU RENALES
  申请人：ACTELION PHARMACEUTICALS LTD

  公开号：WO2003093267A1

  公开（公告）日：2003-11-13

  The invention relates to novel 3,9-diazabicyclo[3.3.1]nonene derivatives of formula (I) and related compounds and their use as active ingredients in the preparation of pharmaceutical compositions. The invention also concerns related aspects including processes for the preparation of the compounds, pharmaceutical compositions containing one or more of those compounds and especially their use as inhibitors or renin.

  该发明涉及新型3,9-二氮杂双环[3.3.1]壬烯衍生物（I）及相关化合物，以及它们作为药物组合物中活性成分的用途。该发明还涉及相关方面，包括制备这些化合物的过程、含有这些化合物中的一个或多个的药物组合物，尤其是它们作为肾素抑制剂的用途。
• Low striation positive diazoketone resist composition with cyclic
  申请人：Allied Corporation

  公开号：US04526856A1

  公开（公告）日：1985-07-02

  A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films.

  提供了一种新型光刻胶配方，具有低条纹和优异的润湿性能。该光刻胶组合物可通过旋涂在集成电路制造中使用的各种基底上应用。该发明的基本组成部分是溶剂组合物，其中包括环戊酮（或环戊酮-环己酮混合物）和一个碳数为5-12的脂肪醇。当这些溶剂成分以某些特定比例使用时，可以意外地提供各种基底的良好润湿性和低条纹薄膜。
• Positive photoresist compositions having deep UV response, photosensitive elements and thermally stable photochemically imaged systems containing same
  申请人：HOECHST CELANESE CORPORATION

  公开号：EP0140273A2

  公开（公告）日：1985-05-08

  Actinic (deep ultraviolet, ultraviolet and visible light sensitive positive photoresist compositions containing a mixture of an alkali-insoluble photoactive compound capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali insoluble and a polymer comprising an amount of tCO-NH-COt groups, such as maleimide and especially maleimide - substituted styrene copolymers, sufficient to render the mixture readily alkali soluble upon exposure to actinic radiation are disclosed. The preferred copolymers include maleimide/styrene or a-methylstyrene in a 1:1 molar ratio. The preferred photoactive compound suitable for a positive photoresist composition responsive to deep UV actinic radiation has the formula 18-8 in Table I. The present invention also contemplates photosensitive elements and thermally stable photochemically imaged systems based on the actinic light sensitive positive photoresist compositions. The positive photoresist compositions are coated onto a substrate to produce a photosensitive element, which upon exposure to a pattern of actinic radiation of wavelength in the range of about 200-700 nm produces a photochemically imaged system that can be treated with an alkaline developer to form highly resolved patterns, by highly selective removal of exposed areas. After development, preferred embodiments of the photochemically images systems exhibit insignificant changes in the highly resolved features (one micron) in the patterned image upon postbaking at temperatures of about 230°C and is, thereafter readily stripped. The high thermal stability exhibited by the photochemically imaged systems formed from the positive photoresist compositions of the present invention allows faster processing at higher temperatures, on equipment like plasma etchers and ion implanters; the developed photochemically imaged systems of the present invention retain high resolution, i.e., retain sharp, steep patterned image profiles.

  本发明公开了阳极（深紫外线、紫外线和可见光敏感的正极光刻胶组合物，该组合物含有一种碱不溶性光活性化合物的混合物，该化合物在暴露于阳极辐射时能够转变成碱溶性物质，其含量足以使该混合物相对碱不溶，还含有一种包含一定量 tCO-NH-COt 基团的聚合物，例如马来酰亚胺，特别是马来酰亚胺-取代苯乙烯共聚物，其含量足以使该混合物在暴露于阳极辐射时容易碱溶解。优选的共聚物包括马来酰亚胺/苯乙烯或 a-甲基苯乙烯，摩尔比为 1:1。适用于对深紫外线辐射有反应的正性光刻胶组合物的优选光活性化合物具有表 I 中的式 18-8。本发明还考虑了基于光敏正性光刻胶组合物的光敏元件和热稳定光化学成像系统。将正性光致抗蚀剂组合物涂在基底上可产生光敏元件，该光敏元件暴露于波长范围约为 200-700 纳米的光辐射图案后，可产生光化学成像系统，该系统可用碱性显影剂处理，通过高度选择性地去除暴露区域，形成高分辨率图案。经过显影后，光化学成像系统的优选实施例在约 230°C 的温度下进行后烘烤时，图案图像中的高分辨率特征（一微米）会出现微小的变化，随后很容易剥离。由本发明的正性光刻胶组合物形成的光化学成像系统具有很高的热稳定性，可以在等离子刻蚀机和离子注入机等设备上以更高的温度进行更快的加工；本发明的光化学成像系统可以保持高分辨率，即保持清晰、陡峭的图案图像轮廓。
• Copolymers useful for the preparation of thermal digital lithographic printing plates
  申请人：Kodak Polychrome Graphics Company Ltd.

  公开号：EP1506983A2

  公开（公告）日：2005-02-16

  A thermally imageable element is disclosed. The element made up of a substrate and a composite layer structure composed of two layer coatings. Preferably, the first layer of the composite is composed of an aqueous developable polymer mixture containing a solubility inhibiting material and a photothermal conversion material which is contiguous to the hydrophilic substrate. The second layer of the composite is insoluble in the aqueous solution, is ink receptive, and is composed of one or more non-aqueous soluble polymers which are soluble or dispersible in a solvent which does not dissolve the first layer. The second layer may also contain a photothermal conversion material. Alternatively, the composite layer may be free of photothermal conversion material when thermal imaging is carried out using a thermal printing head.

  本发明公开了一种热成像元件。该元件由基底和由两层涂层组成的复合层结构构成。复合材料的第一层最好由水性可显影聚合物混合物组成，该混合物含有溶解性抑制材料和光热转换材料，与亲水性基底相邻。复合材料的第二层不溶于水溶液，可接受油墨，由一种或多种非水溶性聚合物组成，这些聚合物可溶于或分散于不溶解第一层的溶剂中。第二层也可以包含光热转换材料。或者，在使用热打印头进行热成像时，复合层可以不含光热转换材料。
• Semiconductor devices, semiconductor packages and methods of forming the same
  申请人：Taiwan Semiconductor Manufacturing Co., Ltd.

  公开号：US10665545B2

  公开（公告）日：2020-05-26

  Semiconductor devices, semiconductor packages and methods of forming the same are provided. One of the semiconductor device includes a dielectric layer and a connector. The dielectric layer includes a dielectric material and an additive, wherein the additive includes a compound represented by Chemical Formula 1. The connector is disposed in the dielectric layer.

  本文提供了半导体器件、半导体封装及其形成方法。其中一种半导体器件包括介电层和连接器。介电层包括介电材料和添加剂，其中添加剂包括由化学式 1 表示的化合物。连接器设置在介电层中。