3-[(p-tolylsulfonyl)oxy]-2-hydroxy-2-methyl-1-phenylpropan-1-one

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 3-[(p-tolylsulfonyl)oxy]-2-hydroxy-2-methyl-1-phenylpropan-1-one
• 英文别名: (2-Hydroxy-2-methyl-3-oxo-3-phenylpropyl) 4-methylbenzenesulfonate
• 化学式: C₁₇H₁₈O₅S
• 分子量: 334.393
• InChiKey: CSTVVWLQXIJRIB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  23
• 可旋转键数：
  6
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.24
• 拓扑面积：
  89
• 氢给体数：
  1
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  2-氯苯丙酮 、 potassium tert-butylate 、 碳酸氢钠 在 氮气 、 对甲苯磺酸 、 paraformaldehyde 作用下， 以 异丙醚 、 甲苯 、 叔丁醇 为溶剂， 生成 3-[(p-tolylsulfonyl)oxy]-2-hydroxy-2-methyl-1-phenylpropan-1-one
  参考文献：
  名称：

  Acid-curable composition containing a masked curing catalyst, and a

  摘要：

  公式为X ##STR1## 的化合物中，其中R.sub.6是芳基，R.sub.7是氢，--OH或烷基，R.sub.8是烷基，R.sub.9是氢，烷基，烯基，芳基，呋喃基或--CCl.sub.3，当n为1时，R.sub.10是烷基，芳基，樟脑基，--CF.sub.3或氟基，或当n为2时，R.sub.10是烷基或芳基，这些化合物是酸可固化烘漆的潜在固化催化剂。在辐照下，从公式X的化合物形成导致树脂酸催化固化的活性固化催化剂。

  公开号：

  US04831177A1

文献信息

• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS À BASE DE SELS DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047151A1

  公开（公告）日：2009-04-16

  Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5- C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2- C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and inter- rupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1- C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6- C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6- C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

  化合物的式子（I），其中X是单键，CRaRb O，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如是氢，R1或COT; T表示T1或O-T2; T1和T2例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C6-C14芳基，C3-C12杂芳基，被一个或多个D取代的C1-C20烷基，被一个或多个E中断的C2-C20烷基，被一个或多个D取代并被一个或多个E或Q中断的C2-C20烷基; R1，R2，R3，R4，Ra，Rb和Rc是T1; D例如是R5，OR5，SR5或Q1; E例如是O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q例如是C6-C12双环烷基，C6-C12双环烯基或C6-C12三环烷基; Q1例如是C6-C14芳基或C3-C12杂芳基; Q2例如是C6-C14芳撑基或C3-C12杂芳撑基; Y是阴离子; M是阳离子; 前提是L，L1，L2，L3，L4，L5，L6，L7和L8中至少有一个不是氢; 并且前提是（i）至少有一个T1或T2是Q组; 或（ii）至少有一个D是Q1组; 或（iii）至少有一个E是Q2组; 适用于光潜催化剂。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS DE SEL DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047105A1

  公开（公告）日：2009-04-16

  Compounds of the Formula (I), wherein L1, L'1, L'1, L2, L'2, L'2, L3, L'3, L'3, L4, L'4 and L'4 for example are hydrogen or COT; R, R' and R' for example are hydrogen,C6-C12aryl or C3-C20heteroaryl; X, X' and X' for exampleare O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2- C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6- C14aryl, providedthat at least one of R, R' or R' is unsubstitutedor substituted C3- C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

  式(I)的化合物，其中L1，L'1，L'1，L2，L'2，L'2，L3，L'3，L'3，L4，L'4和L'4例如是氢或COT；R，R'和R'例如是氢，C6-C12芳基或C3-C20杂环芳基；X，X'和X'例如是O，S，单键，NRa或NCORa，T例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C7-C18环烷基芳基，C5-C18环烷基杂环芳基，C6-C14芳基，前提是至少有一个R，R'或R'是未取代或取代的C3-C20杂环芳基；而Y是无机或有机阴离子；适用于光酸发生剂。
• Iodonium salts as latent acid donors
  申请人：——

  公开号：US20010036591A1

  公开（公告）日：2001-11-01

  Radiation-sensitive compositions comprising (a1) a cationically or acid-catalytically polymerizable or crosslinkable compound or (a2) a compound that increases its solubility in a developer under the action of acid; and (b) at least one diaryliodonium salt of formula I 1 wherein X is branched C 3 -C 20 alkyl or C 3 -C 8 cycloalkyl; X 1 is hydrogen, linear C 1 -C 20 alkyl, branched C 3 -C 20 alkyl or C 3 -C 8 cycloalkyl; with the proviso that the sum of the carbon atoms in X and X 1 is at least 4; Y is linear C 1 -C 10 alkyl, branched C 3 -C 10 alkyl or C 3 -C 8 cycloalkyl; A − is a non-nucleophilic anion, selected from the group (BF 4 ) − , (SbF 6 ) − , (PF 6 ) − , (B(C 6 F 5 )) 4 − , C 1 -C 20 alkylsulfonate, C 2 -C 20 haloalkylsulfonate, unsubstituted C 6 -C 10 arylsulfonate, camphorsulfonate, and C 6 -C 10 arylsulfonate substituted by halogen, NO 2 , C 1 -C 12 alkyl, C 1 -C 12 halo-alkyl, C 1 -C 12 alkoxy or by COOR 1 ; and R 1 is C 1 -C 20 alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C 1 -C 12 alkyl, C 1 -C 12 alkoxy or by halogen; with the proviso that the two phenyl rings on the iodine atom are not identically substituted, have high sensitivity, high storage stability, good solubility and a low tendency to crystallize.

  辐射敏感组合物包括（a1）阳离子或酸催化聚合或交联化合物或（a2）在酸作用下增加其在显影剂中的溶解度的化合物；和（b）至少一种化学式I1的二芳基碘鎓盐，其中X为支链C3-C20烷基或C3-C8环烷基；X1为氢，线性C1-C20烷基，支链C3-C20烷基或C3-C8环烷基；但X和X1中碳原子的总数至少为4；Y为线性C1-C10烷基，支链C3-C10烷基或C3-C8环烷基；A-为非亲核阴离子，从（BF4）-，（SbF6）-，（PF6）-，（B（C6F5））4-，C1-C20烷基磺酸盐，C2-C20卤代烷基磺酸盐，未取代的C6-C10芳基磺酸盐，樟脑磺酸盐和由卤，NO2，C1-C12烷基，C1-C12卤代烷基，C1-C12烷氧基或COOR1取代的C6-C10芳基磺酸盐中选择；R1为C1-C20烷基，苯基，苯甲基；或经C1-C12烷基，C1-C12烷氧基或卤素取代的苯基单取代或多取代；但碘原子上的两个苯环不相同取代，具有高灵敏度，高储存稳定性，良好的溶解度和低结晶倾向。
• Sulphonium Salt Initiators
  申请人：Wolf Jean-Pierre

  公开号：US20090208872A1

  公开（公告）日：2009-08-20

  Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C 1 -C 20 alkyl; C 2 -C 20 alkyl interrupted by one or more O; is -L-X—R 2 or -L-R 2 ; R 1 has for example one of the meanings as given for R; R 2 is a monovalent sensitizer or photoinitiator moiety; Ar 1 and Ar 2 for example independently of one another are phenyl substituted by C 1 -C 20 alkyl, halogen or OR 3 ; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C 1 -C 20 alkyl, OH or OR 3 ; or are —Ar 4 -A-Ar 3 ; Ar 3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C 1 -C 20 alkyl, OR 3 or benzoyl; Ar 4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C 1 -C 20 alkylene; X is CO, C(O)O, OC(O), O, S or NR 3 ; L is C 1 -C 20 alkylene or C 2 -C 20 alkylene interrupted by one or more O; R 3 is C 1 -C 20 alkyl or C 1 -C 20 hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.

  公式（I），（II），（III），（IV）的化合物，其中R是氢，C1-C20烷基; C2-C20烷基中断一个或多个O;为-L-X—R2或-L-R2; R1例如具有给定为R的含义之一; R2是单价敏化剂或光引发剂基团; Ar1和Ar2例如独立地是被C1-C20烷基，卤素或OR3取代的苯基;或未取代的萘基，蒽基，菲基或联苯基;或被C1-C20烷基，OH或OR3取代的萘基，蒽基，菲基或联苯基;或是-Ar4-A-Ar3; Ar3是未取代的苯基，萘基，蒽基，菲基或联苯基;或是被C1-C20烷基，OR3或苯甲酰取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是苯撑，萘撑，蒽撑或菲撑; A是直接键，S，O或C1-C20烷基; X是CO，C（O）O，OC（O），O，S或NR3; L是C1-C20烷基或C2-C20烷基中断一个或多个O; R3是C1-C20烷基或C1-C20羟基烷基; Y是阴离子，适用作光潜酸发生剂。
• Säurehärtbare Zusammensetzung enthaltend einen Maskierten Härtungskatalysator und Verfahren zu deren Härtung
  申请人：CIBA-GEIGY AG

  公开号：EP0089922A2

  公开（公告）日：1983-09-28

  Verbindungen der Formel worin R1, R2, R3, R4, R5 und n die im Anspruch 1 definierte Bedeutung haben, sind latente Härtungskatalysatoren für sauer härtbare Einbrennlacke. Bei Belichtung entstehen aus den Verbindungen der Formel I die wirksamen Härtungskatalysatoren, welche zur säurekatalytischen Härtung der Harze führen.

  式中 R1、R2、R3、R4、R5 和 n 如权利要求 1 所定义的化合物是酸固化搪瓷的潜伏固化催化剂。 在光照下，式 I 化合物产生有效的固化催化剂，导致树脂的酸催化固化。