Near Infrared Ray Activation Type Positive Resin Composition
申请人:Imai Genji
公开号:US20070259279A1
公开(公告)日:2007-11-08
A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.
Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same
申请人:Imai Genji
公开号:US20090045552A1
公开(公告)日:2009-02-19
Provided are a positive resist composition for recording medium master showing excellent plating resistance and adhesion to a base plate such as glass or the like characterized by containing a vinyl polymer which has a monomer unit having an alkali-soluble group blocked by an alkyl vinyl ether, and a method of producing a recording medium master or stamper using this positive resist composition.
US7544461B2
申请人:——
公开号:US7544461B2
公开(公告)日:2009-06-09
Metal-free annulative hydrosulfonation of propiolate esters: synthesis of 4-sulfonates of coumarins and butenolides
作者:Rodney A. Fernandes、Ashvin J. Gangani、Rupesh A. Kunkalkar
DOI:10.1039/c9nj06438a
日期:——
An efficient metal-free and cost-effective method for the synthesis of coumarin and butenolide 4-sulfonates has been developed involving addition of sulfonic acids to ethyl propiolates followed by lactonization.