2-ethyl-2-norbornyl 5-norbornene-2-carboxylate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-ethyl-2-norbornyl 5-norbornene-2-carboxylate
• 英文别名: (2-Ethyl-2-bicyclo[2.2.1]heptanyl) bicyclo[2.2.1]hept-5-ene-2-carboxylate
• 化学式: C₁₇H₂₄O₂
• 分子量: 260.376
• InChiKey: NKGOXEUGMVYJHN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  19
• 可旋转键数：
  4
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.82
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  马来酸酐 、 α-[hydroxy(5-norbornen-2-yl)methyl]-γ-butyrolactone 、 2-ethyl-2-norbornyl 5-norbornene-2-carboxylate 生成
  参考文献：
  名称：

  摘要：

  DOI：

文献信息

• Novel tetrahydrofuran compounds having alicyclic structure
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020183529A1

  公开（公告）日：2002-12-05

  Tetrahydrofuran compounds of formula (1) wherein the broken line represents a single bond, a divalent organic group, or a structure in which the alicyclic structure in the form of norbornene or tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodecene and the tetrahydrofuran cyclic structure share one or two constituent carbon atoms, and k is 0 or 1 are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. 1

  公式（1）中的四氢呋喃化合物，其中断裂的线表示单键，二价有机基团或环状结构，该环状结构以诺博尔烯或四环[4.4.0.12,5.17,10]十二烯的形式存在，并且四氢呋喃环状结构共享一个或两个构成碳原子，k为0或1，是一种新颖且有用的单体，用于形成基础树脂，用于化学增强型抗蚀剂组合物，适用于微细图案印刷。
• Ether, polymer, resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020161150A1

  公开（公告）日：2002-10-31

  An ether compound of formula (1) is provided wherein R 1 is H or C 1-6 alkyl, R 2 is C 1-6 alkyl, R 3 is H, C 1-15 acyl or C 1-15 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV. 1

  提供了一种化学式为（1）的醚化合物，其中R1为H或C1-6烷基，R2为C1-6烷基，R3为H，C1-15酰基或C1-15烷氧羰基，可以用卤素原子取代，k为0或1，m为0到3，n为3到6。该醚化合物聚合形成具有改进反应性、坚固性和基底附着性的聚合物。以该聚合物为基础树脂的抗蚀剂组合物对高能辐射敏感，具有优异的敏感性、分辨率和蚀刻抵抗性，并适用于电子束或深紫外线微图案化。
• Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020197559A1

  公开（公告）日：2002-12-26

  A polymer comprising recurring units of formula (1-1) or (1-2) wherein R 1 , R 2 , R 3 and R 4 are H or alkyl, or R 1 and R 2 , and R 3 and R 4 taken together may form a ring with each pair being alkylene, and k is 0 or 1 and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV. 1

  具有以下公式（1-1）或（1-2）重复单元的聚合物，其中R1、R2、R3和R4为H或烷基，或者R1和R2，以及R3和R4组成的每对可以成为亚烷基环，k为0或1，其Mw为1,000-500,000是新颖的。以该聚合物作为基础树脂的抗蚀剂组合物对高能辐射敏感，具有优异的敏感度、分辨率、蚀刻抗性和最小化膨胀，并适用于电子束或深紫外线微细图案化。
• Cyclic acetal compound, polymer, resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20030045731A1

  公开（公告）日：2003-03-06

  Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance. 1

  公式（1）中，k=0或1，n是0到6的整数的环状缩醛化合物是新颖的。使用环状缩醛化合物作为单体，可以获得聚合物。以该聚合物为基础树脂的抗蚀剂组合物对高能辐射敏感，并具有优异的敏感性、分辨率和蚀刻抵抗性。
• Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
  申请人：Hasegawa Koji

  公开号：US20050142491A1

  公开（公告）日：2005-06-30

  Provided is a novel epoxy compound useful, in photolithography, as a monomer for preparing a photoresist material excellent in transparency and affinity to a substrate. More specifically, provided are an epoxy compound represented by the following formula (1): wherein, R 1 and R 2 each independently represents a hydrogen atom or a linear, branched or cyclic C 1-10 alkyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms, or the constituent —CH 2 — may be substituted by an oxygen atom, or R 1 and R 2 may be coupled together to form an aliphatic hydrocarbon ring; R 3 represents a linear, branched or cyclic C 1-10 alkyl group or a C 1-15 acyl or alkoxycarbonyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms; X represents CH 2 , oxygen or sulfur; k stands for 0 or 1; and m stands for an integer of 0 to 5; and a polymer compound having recurring units available therefrom.

  提供一种新型环氧化合物，可用于光刻工艺中，作为单体制备出具有透明性和对基底亲和力优异的光阻材料。更具体地，提供了一种由以下式（1）表示的环氧化合物：其中，R1和R2各自独立表示氢原子或线性、支链或环状的C1-10烷基基团，其中其一个或多个构成碳原子上的氢原子可以部分或完全被一个或多个卤素原子替代，或者该构成基团的—CH2—可以被一个氧原子替代，或者R1和R2可以结合形成脂肪族碳氢环；R3表示线性、支链或环状的C1-10烷基基团或C1-15酰基或烷氧羰基基团，其中其一个或多个构成碳原子上的氢原子可以部分或完全被一个或多个卤素原子替代；X表示 、氧或硫；k表示0或1；m表示0到5之间的整数；以及可从中获得重复单元的聚合物化合物。