Lactone compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography.
R1 is H or C1-6 alkyl, R2 is H or an acyl or alkoxycarbonyl group of 1-15 carbon atoms which may be substituted with halogen atoms, Z is a divalent C1-15 organic group which forms a lactone ring with the carbonyloxy group, k is 0 or 1, and m is an integer from 0 to 5.
公式(1)的内酯化合物可用作单体,形成基础
树脂,用于
化学增强的抗蚀剂组合物,适用于微图案制造光刻。其中,R1为氢或C1-6烷基,R2为氢或1-15碳原子的酰基或烷氧羰基基团,可以用卤素原子取代,Z为双价的C1-15有机基团,与羰氧基团形成内酯环,k为0或1,m为0至5的整数。