A photosensitive composition is prepared from a mixture of a photosensitive resin containing radicals having the formula ##STR1## wherein X and Y represent hydrogen, halogen, cyano or nitro, Ar represents an aryl radical or a substituted aryl radical, and n represents 1 or 2, and a solvent having the formula ##STR2## wherein R and R" represent a lower alkyl radical and R' represents a lower alkylene radical.
一种光敏组合物是由一种光敏
树脂和一种溶剂混合制备而成。光敏
树脂中含有具有以下公式的基团:##STR1## 其中,X和Y代表氢、卤素、
氰或硝基,Ar代表芳基基团或取代芳基基团,n代表1或2。溶剂具有以下公式:##STR2## 其中,R和R"代表低碳基基团,R'代表低碳亚基基团。