(2-异丙氧乙基)乙酸酯 | 19234-20-9

• 物质功能分类: 有机原料 - 羧酸类化合物及衍生物
• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: (2-异丙氧乙基)乙酸酯
• 中文别名: (2-异丙氧基乙基)乙酸酯
• 英文名称: Ethanol, 2-(1-methylethoxy)-, acetate
• 英文别名: 2-propan-2-yloxyethyl acetate
• CAS: 19234-20-9
• 化学式: C₇H₁₄O₃
• mdl: MFCD00082236
• 分子量: 146.18
• InChiKey: HCDJVEYJSSTYSW-UHFFFAOYSA-N

物化性质

• 沸点：
  95.5 °C(Press: 2.8 Torr)
• 密度：
  0.947±0.06 g/cm3(Predicted)
• LogP：
  1.28 at 40℃

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  10
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.857
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

安全信息

• 危险等级：
  3.2
• 安全说明：
  S23,S24/25
• 危险类别码：
  R10
• 包装等级：
  III
• 危险类别：
  3.2

文献信息

• Amide compounds and pharmaceutical compositions for inhibiting protein kinases, and methods for their use
  申请人：——

  公开号：US20020103203A1

  公开（公告）日：2002-08-01

  Amide compounds that modulate and/or inhibit the activity of certain protein kinases are described. These compounds and pharmaceutical compositions containing them are capable of mediating tyrosine kinase signal transduction in order to modulate and/or inhibit unwanted cell proliferation. The invention is also directed to the therapeutic or prophylactic use of pharmaceutical compositions containing such compounds, and to methods of treating cancer as well as other disease states associated with unwanted angiogenesis and/or cellular proliferation, such as diabetic retinopathy, neovascular glaucoma, rheumatoid arthritis, and psoriasis, by administering effective amounts of such compounds.

  描述了调节和/或抑制特定蛋白激酶活性的酰胺化合物。这些化合物和含有它们的药物组合物能够介导酪氨酸激酶信号传导，以调节和/或抑制不需要的细胞增殖。该发明还涉及含有这些化合物的药物组合物的治疗或预防用途，以及通过给予这些化合物的有效量来治疗癌症以及与不需要的血管生成和/或细胞增殖相关的其他疾病状态，如糖尿病视网膜病变、新生血管性青光眼、类风湿性关节炎和牛皮癣的方法。
• SUBSTITUTED IMIDAZOLES
  申请人：CHUBB NATHAN ANTHONY LOGAN

  公开号：US20070167506A1

  公开（公告）日：2007-07-19

  This invention relates to a range of alpha substituted 2-benzyl substituted imidazole compounds and pharmaceutically acceptable salts and solvates thereof, to compositions comprising such compounds, processes for their synthesis and their use as parasiticides.

  本发明涉及一系列α取代的2-苄基取代咪唑化合物及其药用可接受盐和溶剂化合物，包括这些化合物的组合物、合成过程以及它们作为驱虫剂的用途。
• ZINC OXIDE FILM-FORMING COMPOSITION, ZINC OXIDE FILM PRODUCTION METHOD, AND ZINC COMPOUND
  申请人：Adeka Corporation

  公开号：US20130323413A1

  公开（公告）日：2013-12-05

  Disclosed are a composition for forming a zinc oxide-based film, said composition containing, as an essential component, a zinc compound represented by the following formula (1): wherein R 1 and R 2 mutually independently represent an alkyl group having 1 to 4 carbon atoms, a process for producing the zinc oxide-based film, and the zinc compound. The composition makes it possible to form a high-quality zinc oxide-based film, which has transparency, homogeneity and electrical conductivity, at a low temperature of 300° C. or lower.

  揭示了一种形成氧化锌基膜的组合物，所述组合物包含以下式（1）所表示的锌化合物作为必要组分：其中R1和R2相互独立地表示具有1至4个碳原子的烷基基团，以及制备氧化锌基膜的工艺和锌化合物。该组合物使得能够在300°C或更低的低温下形成具有透明性、均匀性和电导率的高质量氧化锌基膜。
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：US20170052449A1

  公开（公告）日：2017-02-23

  A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).

  一种图案形成方法包括将一种化学放大型光刻胶材料制成的感光树脂组成物的预定区域图案暴露于第一种放射性射线中，该放射性射线是电离辐射或波长不大于400 nm的非电离辐射。图案化暴露的光刻胶材料膜被洪水式暴露于第二种放射性射线中，该放射性射线是波长大于图案化暴露的非电离辐射的波长和大于200 nm的非电离辐射。该化学放大型光刻胶材料包括基础组分和能够在暴露时生成辐射敏感的敏化剂和酸的生成组分。生成组分包括辐射敏感的敏化剂生成剂。辐射敏感的敏化剂生成剂包括由式(A)表示的化合物。
• PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME
  申请人：LEE Jae-Woo

  公开号：US20090155714A1

  公开（公告）日：2009-06-18

  A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.

  本发明揭示了一种比传统光刻胶更小的大小，具有明确定义（均匀）结构的光敏化合物，以及包括该光敏化合物的光刻胶组合物。该光敏化合物由以下公式表示。此外，本发明提供了一种光刻胶组合物，包括1至85重量％（重量％）的光敏化合物；相对于100重量部的光敏化合物0.05至重量份的光酸发生剂；以及10至5000重量部的有机溶剂。在公式中，n为0或1，x为1、2、3、4或5，y为2、3、4、5或6，z为0、1、2、3或4，R、R'和R"分别为1至30碳原子的烃基，优选为2至20碳原子，R'"为氢原子或1至30碳原子的烃基，优选为2至20碳原子。