METAL ALKOXIDE COMPOUND, THIN-FILM-FORMING MATERIAL, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND
申请人:ADEKA CORPORATION
公开号:US20150175642A1
公开(公告)日:2015-06-25
Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R
1
represents a methyl group or an ethyl group, R
2
represents a hydrogen atom or a methyl group, R
3
represents a C
1-3
linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.
METHOD FOR PRODUCING BIPHENYLTETRACARBOXYLIC ACID TETRAESTER
申请人:Nishio Masayuki
公开号:US20110137069A1
公开(公告)日:2011-06-09
Disclosed is a method for producing a biphenyltetracarboxylic acid ester by oxidative coupling a phthalic acid ester by using a catalyst comprising at least a palladium salt, a copper salt and a β-dicarbonyl compound in the presence of a molecular oxygen, wherein the β-dicarbonyl compound is supplied into a reaction mixture liquid intermittently at an interval of less than 30 minutes, or continuously. This method allows, in particular, the selective and economical production of an asymmetric biphenyltetracarboxylic acid tetraester such as 2,3,3′,4′-biphenyltetracarboxylic acid tetraester.
ORGANOMETALLIC COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT USING THE SAME
申请人:SAMSUNG ELECTRONICS CO., LTD.
公开号:US20210388010A1
公开(公告)日:2021-12-16
An organometallic compound and a method of manufacturing an integrated circuit (IC) device, the organometallic compound being represented by Formula (I),
一种有机金属化合物和一种制造集成电路(IC)器件的方法,该有机金属化合物由式(I)表示,
ALUMINUM COMPOUND AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
申请人:Samsung Electronics Co., Ltd.
公开号:US20200207790A1
公开(公告)日:2020-07-02
Provided are an aluminum compound and a method for manufacturing a semiconductor device using the same. The aluminum compound may be represented by Formula 1.
提供了一种铝化合物以及使用它制造半导体器件的方法。该铝化合物可用公式1表示。
Method For Producing Pyrimidinylpyrazole Compounds
申请人:Fukunishi Hirotada
公开号:US20120283441A1
公开(公告)日:2012-11-08
The present invention provides a method for producing a pyrimidinylpyrazole compound (1), wherein aminoguanidine (2) or its salt is reacted with a β-diketone compound (3) to produce the pyrimidinylpyrazole compound:
wherein R
1
and R
3
are each independently an alkyl group having 1 to 4 carbon atoms, and R
2
is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. The method is excellent in the environmental compatibility and economic efficiency.