COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME
申请人:Masuyama Tatsuro
公开号:US20110039209A1
公开(公告)日:2011-02-17
The present invention provides a compound represented by the formula (C1):
wherein R
c2
represents a C6-C10 aromatic hydrocarbon group having at least one nitro group and R
c1
represents a group represented by the formula (1):
wherein R
c4
represents a hydrogen atom etc., R
c5
represents a C1-C30 divalent hydrocarbon group, and R
c3
represents a group represented by the formula (3-1), (3-2) or (3-3):
wherein R
c6
, R
c7
, R
c8
, R
c9
, R
c10
, R
c11
, R
c12
, R
c13
and R
c14
each independently represent a C1-C30 hydrocarbon group, and a photoresist composition comprising a resin, an acid generator and the compound represented by the formula (C1).