申请人:Merck Patent GmbH
公开号:US11365379B2
公开(公告)日:2022-06-21
The present invention relates to a composition consisting essentially of a sulfonic acid component selected from the group consisting of camphor sulfonic acid, and a benzene sulfonic acid of structure (I), wherein R is H or a C-1 to C-18 n-alkyl, oxalic acid, a solvent component which consists essentially of an organic solvent component, or a mixture of an organic solvent components and water, wherein the organic solvent component consist of about 100 wt % to about 85 wt % of said solvent component, and further wherein said organic solvent component is either selected from solvent (III), (IV), (V), (VI) (wherein R is selected from the group consisting of —(-0-CH2—CH2—)n, —OH, —OH, and -0-C(═O)—CH3, wherein n′ is equal to 1, 2, 3, or 4), (VII) (wherein Ra is H or a C-1 to C-4 alkyl moiety), (VIII), (IX) (wherein Rb is a C-1 to C-18 alkyl moiety), (X), and (XI) or is a mixture, of at least two organic solvents selected from this group. The invention also relates to such compositions also containing a surfactant component, and also pertains to the process of using either of these compositions as a resist remover.
Dipropylene glycol monomethyl ether (III),
本发明涉及一种组合物,该组合物主要由选自樟脑磺酸、结构(I)的苯磺酸(其中R为H或C-1至C-18正烷基)、草酸组成的组的磺酸组分、主要由有机溶剂组分组成的溶剂组分或有机溶剂组分与水的混合物组成,其中有机溶剂组分占所述溶剂组分的约100重量%至约85重量%、其中 R 选自-(-0-CH2-CH2-)n、-OH、-OH 和-0-C(═O)-CH3 组成的组、其中 n′等于 1、2、3 或 4)、(VII)(其中 Ra 是 H 或 C-1 至 C-4 烷基)、(VIII)、(IX)(其中 Rb 是 C-1 至 C-18 烷基)、(X)和(XI)或至少两种选自这一组的有机溶剂的混合物。本发明还涉及同样含有表面活性剂成分的此类组合物,并涉及使用其中任一组合物作为抗蚀剂去除剂的工艺。
二丙二醇单甲醚 (III)、