Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.
提供了一种可治愈的组合物,用于具有良好图案性和干法蚀刻抵抗力的印迹。公开了一种可治愈的印迹组合物,包括具有芳香基取代基并具有分子量为100或更高的聚合单体(Ax)和光聚合
引发剂。