Provided are a resist and a compound for the resist improving the sensitivity, the resolution and the line edge roughness (LER) in a good balance without spoiling basic properties of a chemical amplification resist such as pattern shape, dry etching resistance, heat resistance and the like. Provided are a method for producing an alicyclic ester compound expressed by general formula (1), an alicyclic ester compound expressed by general formula (1), a (meth)acrylic copolymer obtained by polymerization of the alicyclic ester compound, and a photosensitive resin composition containing the (meth)acrylic copolymer. A method for producing an alicyclic ester compound expressed by general formula (1) includes reacting an adamantane compound expressed by general formula (2) with hydroxyalkylamine expressed by general formula (3) to produce an adamantaneamide compound expressed by general formula (4), and then reacting the adamantaneamide compound expressed by general formula (4) with (meth)acrylic acid.
提供了一种抗蚀剂和化合物,用于在不破坏
化学放大抗蚀剂的基本性能(如图案形状、干法蚀刻抗性、耐热性等)的情况下,平衡提高敏感性、分辨率和线边粗糙度(LER)。提供了一种制备由通式(1)表示的脂环酯化合物的方法,一种由通式(1)表示的脂环酯化合物,通过聚合脂环酯化合物得到的(甲)基
丙烯酸酯共聚物,以及含有(甲)基
丙烯酸酯共聚物的光敏
树脂组合物。制备由通式(1)表示的脂环酯化合物的方法包括将由通式(2)表示的
金刚烷化合物与由通式(3)表示的羟基烷基胺反应,生成由通式(4)表示的
金刚酰胺化合物,然后将由通式(4)表示的
金刚酰胺化合物与(甲)基
丙烯酸反应。