A novel stilbene-ether type of photolabile protecting group (PPG) for hydroxyl group has been developed. It contains a stable aryl ether group in the protected form and can be deprotected by acid-catalyzed photorearrangement under 300-nm irradiation. The selective deprotection has also been achieved by irradiation of the mixture of 4-alkoxystilbene and 2-(4-alkoxystyryl)furan at 365 nm.
已经开发了新颖的
二苯乙烯-
醚类型的对羟基的光不稳定保护基(P
PG)。它包含受保护形式的稳定的芳基醚基,可以在300 nm辐射下通过酸催化的光重排进行脱保护。选择性脱保护也已经通过在365nm处辐射4-烷氧基sti和2-(4-烷氧基
苯乙烯基)
呋喃的混合物来实现。