MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20160179002A1
公开(公告)日:2016-06-23
A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution.