3-[4-(4,6-二苯基-1,3,5-三嗪-2-基)-3-羟基苯氧基]乙基-2-乙基己酸酯 | 371146-04-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 中文名称: 3-[4-(4,6-二苯基-1,3,5-三嗪-2-基)-3-羟基苯氧基]乙基-2-乙基己酸酯
• 英文名称: Hexanoic acid, 2-ethyl-, 2-[4-(4,6-diphenyl-1,3,5-triazin-2-yl)-3-hydroxyphenoxy]ethyl ester
• 英文别名: 2-[4-(4,6-diphenyl-1,3,5-triazin-2-yl)-3-hydroxyphenoxy]ethyl 2-ethylhexanoate
• CAS: 371146-04-2
• 化学式: C₃₁H₃₃N₃O₄
• 分子量: 511.6
• InChiKey: VVBVFVRWEMORTQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.3
• 重原子数：
  38
• 可旋转键数：
  13
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  94.4
• 氢给体数：
  1
• 氢受体数：
  7

文献信息

• NOVEL TRIAZINE COMPOUND AND SYNTHETIC RESIN COMPOSITION USING SAME
  申请人：ADEKA CORPORATION

  公开号：US20170327475A1

  公开（公告）日：2017-11-16

  A novel compound excellent in heat resistance, resistance to volatilization, and compatibility with a resin component and useful as a UV absorber and a synthetic resin composition containing the compound are provided. Specifically provided are a triazine compound of general formula (1), preferably general formula (2) and a synthetic resin composition containing 0.001 to 20 parts by mass of the compound per 100 parts by mass of a synthetic resin. The details of formulae (1) and (2) are as defined in the description.

  提供了一种在耐热性、抗挥发性和与树脂成分的相容性方面表现出色的新型化合物，可用作紫外线吸收剂和含有该化合物的合成树脂组合物。具体提供的是一般式（1）的三嗪化合物，优选一般式（2）的化合物和含有该化合物每100份合成树脂中0.001至20质量份的合成树脂组合物。一般式（1）和（2）的细节如描述中定义。
• 2-Hydroxyphenyl-s-triazine crosslinkers for polymer networks
  申请人：Bolle Thomas

  公开号：US20050075465A1

  公开（公告）日：2005-04-07

  Compounds of the general formula I′ in which R 1 is H, C 1 -C 12 alkyl; C 5 -C 12 cycloalkyl; C 2 -C 18 alkyl which is interrupted by one or more O; SR 4 ; OR 5 ; or is a group of formula II or III R 2 , R 21 and R 3 independently of one another, are H or —Y-T as defined in claim 1, where T is a reactive group selected from OH, acryl- and methacryloxy and arylcarbonate groups, and further symbols are as defined in claim 1, are effective as crosslinking agents for polymeric networks, especially as in flexographic printing plates, coatings, and plastic containers or films. Further provided is a method of protecting the content of a clear or lightly colored plastic container or film against the deleterious effects of ultraviolet radiation, which method comprises permanently and covalently bonding one or more UV absorbing moieties of a durable s-triazine UV absorber via condensation to a suitable polymer component.

  通式为I′的化合物，其中R1为H、C1-C12烷基；C5-C12环烷基；被一个或多个O中断的C2-C18烷基；SR4；OR5；或为公式II或IIIR2、R21和R3独立的基团，为H或-Y-T，其中T为从OH、丙烯酰基和甲基丙烯酰氧基和芳基碳酸酯基中选择的反应性基团，其它符号如权利要求1所定义的，作为聚合物网络的交联剂，特别是作为柔性版印刷板、涂层和塑料容器或薄膜的交联剂具有效果。此外，还提供了一种保护透明或浅色塑料容器或薄膜的内容物免受紫外线有害影响的方法，该方法通过缩合将一种耐久的s-三嗪紫外线吸收剂的一个或多个UV吸收基团与适当的聚合物组分永久共价键合。
• PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING
  申请人：ENG J. Mon Hei

  公开号：US20120146257A1

  公开（公告）日：2012-06-14

  The cycle time of polymer compositions subjected to a rotomolding process is improved (i.e., reduced), while the processing window is simultaneously enlarged through the use of a polymer-stabilizing amount of a processing stabilizer system having at least one chroman-based compound according to Formula V:

  通过使用至少含有一个基于香豆素的化合物的聚合物稳定剂系统，按照V公式，聚合物组合物经过旋转成型处理的周期时间得到改进（即减少），同时加大了处理窗口。
• Stabilizer Compositions Containing Substituted Chroman Compounds and Methods of Use
  申请人：GUPTA Ram

  公开号：US20130145962A1

  公开（公告）日：2013-06-13

  Stabilizer compositions having a chroman-based compound according to Formula (V): and their use in processes for stabilizing organic materials subject to degradation and/or discoloration due to the effects from light, oxygen and heat, and in processes for producing articles from organic materials blended therewith, are provided herein.

  本文提供了具有基于香豆素的化合物的稳定剂组合物，其化学式如下（V）：及其在稳定易受光、氧和热降解和/或变色的有机材料的过程中的使用，以及在与有机材料混合后制造物品的过程中的使用。
• FILM FORMING MATERIAL, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, MATERIAL FOR OPTICAL COMPONENT FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, PERMANENT FILM FOR RESIST, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, AND CIRCUIT PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200157060A1

  公开（公告）日：2020-05-21

  A film forming material containing a triazine-based compound represented by the following formula (1): wherein R 1 , R 2 , and R 3 each independently represent a hydrogen atom, a linear alkyl group having 1 to 30 carbon atoms and optionally having a substituent, a branched alkyl group having 1 to 30 carbon atoms and optionally having a substituent, a cycloalkyl group having 3 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, an alkylaryl group having 7 to 30 carbon atoms and optionally having a substituent, an arylalkyl group having 7 to 30 carbon atoms and optionally having a substituent, a hydroxyl group, or a group in which a hydrogen atom of a hydroxyl group is replaced with an acid dissociation group or a crosslinkable reactive group, wherein the alkyl group, the cycloalkyl group, the aryl group, the alkenyl group, the alkoxy group, the alkylaryl group, or the arylalkyl group each optionally contains an ether bond, a ketone bond, an ester bond, or a crosslinkable reactive group; S 1 , S 2 , and S 3 each independently represent a hydrogen atom, a hydroxyl group, a group in which a hydrogen atom of a hydroxyl group is replaced with an acid dissociation group or a crosslinkable reactive group, or an alkoxy group having 1 to 30 carbon atoms; T 1 , T 2 , and T 3 each independently represent a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 30 carbon atoms, or an alkenyl group having 2 to 30 carbon atoms; Y 1 , Y 2 , and Y 3 each independently represent a hydrogen atom, a hydroxyl group, a group in which a hydrogen atom of a hydroxyl group is replaced with an acid dissociation group or a crosslinkable reactive group, an alkyl, alkoxy, alkoxycarbonyl or arylalkyl group having 1 to 30 carbon atoms, or an alkenyl group having 2 to 30 carbon atoms; E 1 , E 2 , and E 3 each independently represent a single bond, —O—, —CH 2 O—, —COO—, or —NH—; and each P independently represents an integer of 0 to 1.

  一种含有以下式子（1）所表示的三嗪基化合物的成膜材料： 式中，R1、R2和R3各自独立地表示氢原子、具有1至30个碳原子的线性烷基基团，可选地具有取代基、具有1至30个碳原子的支链烷基基团，可选地具有取代基、具有3至30个碳原子的环烷基基团，可选地具有取代基、具有6至30个碳原子的芳基基团，可选地具有取代基、具有2至30个碳原子的烯基基团，可选地具有取代基、具有1至30个碳原子的烷氧基团，可选地具有取代基、具有7至30个碳原子的烷基芳基基团，可选地具有取代基、具有7至30个碳原子的芳基烷基基团，可选地具有取代基、羟基或羟基的氢原子被酸解离基团或可交联反应基团所取代的基团，其中烷基基团、环烷基基团、芳基基团、烯基基团、烷氧基团、烷基芳基基团或芳基烷基基团各自可选地包含醚键、酮键、酯键或可交联反应基团；S1、S2和S3各自独立地表示氢原子、羟基、羟基的氢原子被酸解离基团或可交联反应基团或具有1至30个碳原子的烷氧基团；T1、T2和T3各自独立地表示氢原子、羟基、具有1至30个碳原子的烷基或具有2至30个碳原子的烯基基团；Y1、Y2和Y3各自独立地表示氢原子、羟基、羟基的氢原子被酸解离基团或可交联反应基团、具有1至30个碳原子的烷基、烷氧基、烷氧羰基或芳基烷基基团或具有2至30个碳原子的烯基基团；E1、E2和E3各自独立地表示单键、-O-、-CH2O-、-COO-或-NH-；每个P独立地表示0至1的整数。