2-hydroxy-5-[(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornane | 630414-93-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-hydroxy-5-[(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornane
• 英文别名: 5-[3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]-norbornan-2-ol；5-[3,3,3-Trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]bicyclo[2.2.1]heptane-2-ol；5-[3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]bicyclo[2.2.1]heptan-2-ol
• CAS: 630414-93-6
• 化学式: C₁₁H₁₄F₆O₂
• 分子量: 292.221
• InChiKey: ANPSZPFILCGMBY-UHFFFAOYSA-N

物化性质

• 沸点：
  312.8±37.0 °C(Predicted)
• 密度：
  1.438±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  19
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  8

反应信息

• 作为反应物：
  描述：

  2-hydroxy-5-[(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornane 、 乙烯基乙醚 在 mercury(II) diacetate 三乙胺 作用下， 反应 53.0h， 生成 5-[(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornan-2-yl vinyl ether
  参考文献：
  名称：

  Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions

  摘要：

  提供具有结构式（I）的氟化乙烯醚，其中结构式（I）中的X和Y中至少有一个是氟原子，而L、R1、R2、R3、R4如本文所定义。还提供由（I）和可能不是氟化的第二单体进行自由基聚合制备的共聚物。这些聚合物在光刻光阻组合物中很有用，特别是化学放大光阻。在一个首选实施例中，这些聚合物对深紫外（DUV）辐射几乎透明，因此在DUV光刻光阻组合物中很有用。还提供一种使用该组合物在基板上生成抗蚀图像的方法，即在集成电路或类似产品的制造中。

  公开号：

  US20060287558A1
• 作为产物：
  描述：

  六氟异丙醇甲基降冰片烯 在 甲酸 、 水 作用下， 以84%的产率得到2-hydroxy-5-[(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornane
  参考文献：
  名称：

  Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions

  摘要：

  提供具有结构式（I）的氟化乙烯醚，其中结构式（I）中的X和Y中至少有一个是氟原子，而L、R1、R2、R3、R4如本文所定义。还提供由（I）和可能不是氟化的第二单体进行自由基聚合制备的共聚物。这些聚合物在光刻光阻组合物中很有用，特别是化学放大光阻。在一个首选实施例中，这些聚合物对深紫外（DUV）辐射几乎透明，因此在DUV光刻光阻组合物中很有用。还提供一种使用该组合物在基板上生成抗蚀图像的方法，即在集成电路或类似产品的制造中。

  公开号：

  US20060287558A1

文献信息

• Process for producing alpha-substituted acrylic norbornanyyl compounds
  申请人：Komata Takeo

  公开号：US20050131248A1

  公开（公告）日：2005-06-16

  A process for producing an α-substituted acrylic norbornanyl compound represented by the formula [3] includes reacting an α-substituted acrylic acid anhydride represented by the formula [1] with a substituted norbornanyl alcohol represented by the formula [2]. wherein R 1 represents a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, and wherein one of R 2 , R 3 and R 4 is a CF 3 C(CF 3 )(OH)CH 2 — group, and each of the other two of R 2 , R 3 and R 4 is a hydrogen.

  生产α-取代丙烯基莽环烷基化合物的过程如下：将式[1]表示的α-取代丙烯酸酐与式[2]表示的取代莽环烷基醇反应。 其中，R1代表氢原子、甲基、乙基、正丙基、异丙基、正丁基、仲丁基、叔丁基、氟甲基、二氟甲基、三氟甲基或全氟乙基；R2、R3和R4中的一个是 C(CF3)(OH)CH2—基团，另外两个是氢原子。
• Fluorine-containing cyclic esters, fluorine-containing cyclic alcohols, and their production processes
  申请人：Central Glass Company, Limited

  公开号：US20040180954A1

  公开（公告）日：2004-09-16

  A fluorine-containing cyclic ester is represented by the formula 1: 1 wherein each R 1 independently represents —H or —F, wherein R 2 is one selected from the group consisting of —H, —F, —CF 3 , —OH, —COOH and —COOR 4 , where R 4 is an alkyl group having a carbon atom number of 1-15, and wherein R 3 is a substituent selected from the group consisting of —F, —CF 3 , and —R 5 C(CF 3 ) 2 OR 6 , where R 5 is one selected from the group consisting of CH 2 , C 2 H 4 , and OCH 2 , and R 6 is H or an acid-labile protecting group.

  化学式1:1代表含氟环状酯，其中每个R1独立地表示-H或-F，其中R2为以下组中的一种：-H，-F，-CF3，-OH，-COOH和-COOR4，其中R4是具有1-15个碳原子的烷基基团，而R3是从以下组中选择的取代基：-F，- 和-R5C( )2OR6，其中R5为以下组中的一种：CH2，C2H4和O ，而R6为H或酸敏感保护基。
• Preparation of topcoat compositions and methods of use thereof
  申请人：International Business Machines Corporation

  公开号：US07473749B2

  公开（公告）日：2009-01-06

  A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from an alcohol is provided. Also provided is a method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

  提供一种包括含氟聚合物和从醇中选择的铸模溶剂的面漆组合物。还提供一种在光阻剂上形成图像的方法，包括在基板上形成光阻剂；施加一种面漆组合物，该面漆组合物包括至少一种含氟聚合物和一个铸模溶剂，施加到光阻剂上；去除面漆组合物的铸模溶剂，从而形成光阻剂上的面漆材料；将光阻剂暴露在辐射下，辐射改变光阻剂暴露于辐射的区域的化学组成，形成光阻剂中的暴露和未暴露区域；和去除i)面漆材料和ii)光阻剂的暴露区域或未暴露区域。
• Coating Materials Consisting of Low- or Medium-Molecular Organic Compounds
  申请人：Miyazawa Satoru

  公开号：US20090272295A1

  公开（公告）日：2009-11-05

  A coating material including a low-molecular or medium-molecular organic compound represented by general formula (1). (In the formula, R 1 is a single bond, methylene, ethylene or oxygen; and R 2 is a hydrogen atom, or a hydrocarbon group, a fluorine-containing alkyl group, a cyclic form containing an aromatic group or aliphatic group, which may contain hydroxy group, carboxyl group, amino group, amide group, imide group, glycidyl group, cyano group, fluorocarbinol group, sulfonic group or sulfonylamide group, and a complex thereof, and may contain a fluorine atom, oxygen atom, nitrogen atom, silicon atom or sulfur atom, and R 2 's of the same type or different type may be connected by an ester bond, amide bond, ether bond, thioether bond, thioester bond or urethane bond.). This compound can be derived from a diol compound and bicyclo[2.2.2]octane-2,3:5,6-tetracarboxylic anhydride.
• POLYMERIZABLE TERTIARY ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20130189620A1

  公开（公告）日：2013-07-25

  The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.