2-isopropyl-10-methylacridin-9(10H)-one | 68347-36-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 喹啉及其衍生物
• 英文名称: 2-isopropyl-10-methylacridin-9(10H)-one
• 英文别名: 2-Isopropyl-N-methylacridon；2-isopropyl-10-methyl-10H-acridin-9-one；10-Methyl-2-propan-2-ylacridin-9-one
• CAS: 68347-36-4
• 化学式: C₁₇H₁₇NO
• 分子量: 251.328
• InChiKey: PXQJYPYQKJXHFP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  19
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.24
• 拓扑面积：
  20.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  一氧化碳 、 N-methyl-2-bromo-4'-isopropyldiphenylamine 在 N,N-二甲基甲酰胺 、 cesium pivalate 、 tricyclohexylphosphine tetrafluoroborate 、 palladium dichloride 作用下， 反应 12.0h， 以73%的产率得到2-isopropyl-10-methylacridin-9(10H)-one
  参考文献：
  名称：

  通过钯催化的2-溴-二芳基胺的羰基化合成a烯

  摘要：

  通过钯催化的2-溴-二芳基胺的钯催化羰基化/ C H活化序列，已经开发了一种简便的合成cri啶酮衍生物的方案，产率中等至优异。反应平稳进行，并使富电子和缺电子的底物均转化为相应的cri啶。

  DOI：

  10.1016/j.tetlet.2018.06.004

文献信息

• 一种吖啶酮及其衍生物的制备方法
  申请人：南京邮电大学

  公开号：CN108276334B

  公开（公告）日：2021-03-19

  本发明公开了一种吖啶酮及其衍生物的制备方法，该方法以2‑卤代二苯胺类化合物为底物，在一氧化碳气体氛围下，通过钯催化的羰基化反应实现吖啶酮及其衍生物的制备。本方法的反应原料较为易得，反应条件温和；此方法打破了在传统制备方法中，底物需要预先引入羰基官能团前体的限制，以一氧化碳为羰基的直接来源，通过羰基化反应一步构筑两个C‑C键，最符合有机合成中原子经济，合成步骤经济以及绿色化学的理念，发展了有机方法学，也实现了对吖啶酮类化合物的高效制备。
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：US20170052449A1

  公开（公告）日：2017-02-23

  A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).

  一种图案形成方法包括将一种化学放大型光刻胶材料制成的感光树脂组成物的预定区域图案暴露于第一种放射性射线中，该放射性射线是电离辐射或波长不大于400 nm的非电离辐射。图案化暴露的光刻胶材料膜被洪水式暴露于第二种放射性射线中，该放射性射线是波长大于图案化暴露的非电离辐射的波长和大于200 nm的非电离辐射。该化学放大型光刻胶材料包括基础组分和能够在暴露时生成辐射敏感的敏化剂和酸的生成组分。生成组分包括辐射敏感的敏化剂生成剂。辐射敏感的敏化剂生成剂包括由式(A)表示的化合物。
• PHOTOPOLYMERIZATION INITIATOR AND ACTINIC RADIATION-CURABLE COMPOSITION COMPRISING THE SAME
  申请人：NIPPON KAYAKU KABUSHIKI KAISHA

  公开号：EP0844255A1

  公开（公告）日：1998-05-27

  This invention provides an energy ray curable composition which has excellent curability. The composition contains a cationic polymerizable substance, a photopolymerization initiator comprised of a specified onium salt and a pigment as occasion demands. The curable composition is excellent in curability, and cured paint films obtained therefrom shows excellent glossiness. This composition can be blended in white inks, printing inks, paints, resist inks, wood fillers and the like.

  本发明提供了一种能量射线固化组合物，它具有优异的固化性能。该组合物含有一种阳离子可聚合物质、一种由特定鎓盐组成的光聚合引发剂和一种颜料。该固化组合物具有极佳的固化性，由此获得的固化漆膜具有极佳的光泽度。这种组合物可用于调配白墨、印刷油墨、涂料、抗蚀剂油墨、木材填料等。
• Chemically amplified resist material and resist pattern-forming method
  申请人：JSR CORPORATION

  公开号：US10018911B2

  公开（公告）日：2018-07-10

  A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the generative component comprises the first compound that is radiation-sensitive and second compound that is radiation-sensitive. The first compound includes a first onium cation and a first anion, and the second compound includes a second onium cation and a second anion that is different from the first anion. Each of an energy released upon reduction of the first onium cation to a radical and an energy released upon reduction of the second onium cation to a radical is less than 5.0 eV.

  一种化学放大抗蚀剂材料包括一种在酸的作用下能溶于或不溶于显影液的聚合物成分，以及一种在曝光时能产生辐射敏感敏化剂和酸的生成成分。生成组件中的辐射敏感性酸和敏化剂生成剂或辐射敏感性酸生成剂包括辐射敏感性第一化合物和辐射敏感性第二化合物。第一化合物包括第一鎓阳离子和第一阴离子，第二化合物包括第二鎓阳离子和不同于第一阴离子的第二阴离子。第一鎓阳离子还原成自由基时释放的能量和第二鎓阳离子还原成自由基时释放的能量均小于 5.0 eV。
• Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting
  申请人：TOKYO ELECTRON LIMITED

  公开号：US10025187B2

  公开（公告）日：2018-07-17

  A photosensitization chemical-amplification type resist material according to the present invention is used for a two-stage exposure lithography process, and contains (1) a developable base component and (2) a component generating a photosensitizer and an acid through exposure. Among three components consisting of (a) an acid-photosensitizer generator, (b) a photosensitizer precursor, and (c) a photoacid generator, the above component contains only the component (a), any two components, or all of the components (a) to (c).

  根据本发明，一种光敏化学放大型抗蚀剂材料用于两阶段曝光光刻工艺，它包含(1)可显影碱成分和(2)通过曝光产生光敏剂和酸的成分。在由(a)酸-光敏剂发生器、(b)光敏剂前体和(c)光酸发生器组成的三个组件中，上述组件只包含(a)组件、任意两个组件或(a)至(c)的所有组件。