acrylic acid 5-(2-triluforomethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbomanyl ester | 815583-96-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: acrylic acid 5-(2-triluforomethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbomanyl ester
• 英文别名: 5-[3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]-norbornan-2-yl 2-acrylate；norbornenehexafluoroalcohol acrylate；Acrylic acid 5-[2-(trifluoromethyl)-2-hydroxy-3,3,3-trifluoropropyl]bicyclo[2.2.1]heptane-2-yl ester；[5-[3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]-2-bicyclo[2.2.1]heptanyl] prop-2-enoate
• CAS: 815583-96-1
• 化学式: C₁₄H₁₆F₆O₃
• 分子量: 346.27
• InChiKey: XRKDFOSUGVVPRM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  23
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  丙烯酸 、 六氟异丙醇甲基降冰片烯 在 camphor-10-sulfonic acid 作用下， 反应 20.0h， 生成 acrylic acid 5-(2-triluforomethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbomanyl ester 、 acrylic acid 6-(2-trifluoromethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbornanyl ester 、 5,5-bis(trifluoromethyl)-4-oxatricyclo[5.2.1.0(3,8)]decane
  参考文献：
  名称：

  Process for Producing Alpha-Substituted Norbornanyl Acrylates

  摘要：

  本发明公开了一种在工业规模下高效制备α-取代诺博烯基丙烯酸酯的方法，同时抑制了由分子内环化、过量添加丙烯酸等产生的副产物的形成。所述α-取代诺博烯基丙烯酸酯可用作诺博烯抗蚀单体。在所公开的方法中，α-取代丙烯酸直接与取代诺博烯在甲烷磺酸和樟脑磺酸中至少选择一种酸催化剂的存在下反应。在该反应中，可以抑制由分子内环化、酸的过量添加到反应产物等产生的副产物的形成。

  公开号：

  US20110137073A1

文献信息

• Process for producing alpha-substituted acrylic norbornanyyl compounds
  申请人：Komata Takeo

  公开号：US20050131248A1

  公开（公告）日：2005-06-16

  A process for producing an α-substituted acrylic norbornanyl compound represented by the formula [3] includes reacting an α-substituted acrylic acid anhydride represented by the formula [1] with a substituted norbornanyl alcohol represented by the formula [2]. wherein R 1 represents a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, and wherein one of R 2 , R 3 and R 4 is a CF 3 C(CF 3 )(OH)CH 2 — group, and each of the other two of R 2 , R 3 and R 4 is a hydrogen.

  生产α-取代丙烯基莽环烷基化合物的过程如下：将式[1]表示的α-取代丙烯酸酐与式[2]表示的取代莽环烷基醇反应。 其中，R1代表氢原子、甲基、乙基、正丙基、异丙基、正丁基、仲丁基、叔丁基、氟甲基、二氟甲基、三氟甲基或全氟乙基；R2、R3和R4中的一个是CF3C(CF3)(OH)CH2—基团，另外两个是氢原子。
• POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
  申请人：Iwashita Jun

  公开号：US20090162785A1

  公开（公告）日：2009-06-25

  There are provided a polymer compound which can form a resist pattern with excellent resolution, and a negative resist composition containing the polymer compound and a resist pattern-forming method thereof. The present invention is a polymer compound containing a structural unit (a0) represented by a general formula (a0-1) shown below. (wherein, R represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R 0 represents an alkyl group containing a hydroxyl group.) Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by the general formula (a0-1) shown above.

  本发明提供了一种聚合物化合物，可以形成具有优异分辨率的抗蚀图案，以及包含该聚合物化合物的负型抗蚀组合物和其制备方法。本发明是一种聚合物化合物，其中包含下式所示的通式（a0-1）所代表的结构单元（a0）。（其中，R代表氢原子、卤素原子、烷基或卤代烷基；R0代表含有羟基的烷基。）此外，本发明还提供了一种负型抗蚀组合物，包括：碱溶性树脂组分（A）、在曝光时生成酸的酸发生器组分（B）和交联剂（C），其中碱溶性树脂组分（A）含有具有上述通式（a0-1）所代表的结构单元（a0）的聚合物化合物（A1）。
• Resin and resist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10766992B2

  公开（公告）日：2020-09-08

  A resin containing a structural unit derived from a compound represented by the formula (aa) wherein T, R1 and Z1 are defined in the specification.

  一种树脂，含有由式 (aa) 所示化合物衍生的结构单元 其中 T、R1 和 Z1 的定义见说明书。
• Photosensitive resin composition and display device including the same
  申请人：Samsung Display Co., Ltd.

  公开号：US10982061B2

  公开（公告）日：2021-04-20

  A photosensitive resin composition includes: a) an acryl-based copolymer obtained by copolymerizing i) a hydroxyl group-containing unsaturated compound; ii) an unsaturated carboxylic acid, an unsaturated carboxylic anhydride, or a mixture thereof; iii) an epoxy group-containing unsaturated compound; and iv) an olefin-based unsaturated compound, b) a 1,2-quinonediazide 5-sulfonic ester compound having a phenol compound including a compound represented by the above Chemical Formula A as ballast, c) a silane coupling agent, and d) a solvent.

  一种光敏树脂组合物包括a) 一种丙烯基共聚物，通过共聚 i) 含羟基的不饱和化合物；ii) 不饱和羧酸、不饱和羧酸酐或它们的混合物；iii) 含环氧基的不饱和化合物；b) 1,2-醌噻嗪-5-磺酸酯化合物，其苯酚化合物包括上述化学式 A 所代表的化合物作为镇流器； c) 硅烷偶联剂；以及 d) 溶剂。
• MATERIAL FOR RESIST PROTECTIVE FILM FOR IMMERSION LITHOGRAPHY
  申请人：Takebe Yoko

  公开号：US20090061360A1

  公开（公告）日：2009-03-05

  To provide a resist protective film material for immersion lithography. An alkali soluble resist protective film material for immersion lithography, which comprises a polymer (F) containing repeating units (F U ) formed by polymerizing a polymerizable compound (f m ) having a fluorine-containing bridged cyclic structure. For example, repeating units (F U ) are repeating units formed by polymerizing a compound (f) selected from the group consisting of the following formulae (f1) to (f4) (R F represents H, F, a C 1-3 alkyl group or a C 1-3 fluoroalkyl group, and X F represents F, OH or CH 2 OH.)