[EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANKS INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD AND PHOTOMASK<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS OU AU RAYONNEMENT ACTINIQUE(S), FILM SENSIBLE AUX RAYONS OU AU RAYONNEMENT ACTINIQUE(S), ÉBAUCHES DE MASQUES COMPRENANT UN FILM SENSIBLE AUX RAYONS OU AU RAYONNEMENT ACTINIQUE(S), PROCÉDÉ DE FORMATION DE MOTIFS ET MASQUE PHOTOGRAPHIQUE
                        
                            
                                申请人:FUJIFILM CORP
                            
                            
                                公开号:WO2014010392A1
                            
                            
                                公开(公告)日:2014-01-16
                            
                            An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)