[EN] INFRARED ABSORBING COMPOUNDS AND THEIR USE IN IMAGEABLE ELEMENTS<br/>[FR] COMPOSES ABSORBEURS D'UV ET LEUR UTILISATION DANS DES ELEMENTS IMAGEABLES
申请人:KODAK POLYCHROME GRAPHICS LLC
公开号:WO2004069938A1
公开(公告)日:2004-08-19
Infrared absorbing compounds in which both the anion and the cation absorb infrared radiation, imageable elements that contain these compounds, and methods for forming images using the imageable elements are disclosed. The compounds have the structure (I) and (II) in which Y1 and Y2 are each independently hydrogen, halo, alkyl, diphenylamino, or phenylthio; R1, R2, R3 and R4 are each independently hydrogen, methyl, or SO3-, with the proviso that two fo R1, R2, R3, and R4 are SO3-; R5 and R6 are each independently an alkyl group; Z1, Z2, Z4 and Z5 are each independently a benzo group or a nophtho group; Z3 and Z6 are each independently two hydrogen atoms, a cyclohexene residue, or a cyclopentene residue; X1, X2, X3, and X4 are each independently S, O, NH, CH2, or C(CH3)2; and n1 and n2 are each independently 0 to 4.
本发明涉及吸收红外辐射的化合物,其中阴离子和阳离子均吸收红外辐射,包含这些化合物的可成像元素以及使用可成像元素形成图像的方法。化合物具有结构(I)和(II),其中Y1和Y2分别独立地为氢、卤素、烷基、二苯胺或苯硫醚;R1、R2、R3和R4分别独立地为氢、甲基或SO3-,但其中两个为SO3-;R5和R6分别独立地为烷基;Z1、Z2、Z4和Z5分别独立地为苯并环或萘并环;Z3和Z6分别独立地为两个氢原子、环己烯残基或环戊烯残基;X1、X2、X3和X4分别独立地为S、O、NH、CH2或C(CH3)2;n1和n2分别独立地为0至4。