1-cyano-5-(2-methacryloyloxyacetoxy)-3-oxatricyclo[4.2.1.0^4,8]nonan-2-one | 1131171-54-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 1-cyano-5-(2-methacryloyloxyacetoxy)-3-oxatricyclo[4.2.1.0^4,8]nonan-2-one
• 英文别名: 1-cyano-5-(2-methacryloyloxyacetoxy)-3-oxatricyclo[4.2.1.04,8]nonan-2-one；[2-[(6-cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl)oxy]-2-oxoethyl] 2-methylprop-2-enoate
• CAS: 1131171-54-4
• 化学式: C₁₅H₁₅NO₆
• 分子量: 305.287
• InChiKey: GNWRTATVVONZGU-UHFFFAOYSA-N

物化性质

• 沸点：
  519.0±50.0 °C(Predicted)
• 密度：
  1.38±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  22
• 可旋转键数：
  6
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  103
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  1-cyano-5-(2-methacryloyloxyacetoxy)-3-oxatricyclo[4.2.1.0^4,8]nonan-2-one 、 tin(IV) chloride 在 盐酸 、 乙酸酐 作用下， 以 乙酸乙酯 为溶剂， 以14%的产率得到1-(N-acetylcarbamoyl)-5-(2-methacryloyloxyacetoxy)-3-oxatricyclo[4.2.1.0^4,8]nonan-2-one
  参考文献：
  名称：

  MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POLYMERIC COMPOUND

  摘要：

  揭示了一种含有N-酰基氨酰基基团和内酯骨架的单体。该单体以式(1)为例，其中R通常选择自氢和C1-C6烷基；R1在每次出现时，通常选择自卤素和可选择卤代的C1-C6烷基；“A”选择自C1-C6亚烷基、氧、硫和非键合；m表示0到8的整数；X在每次出现时独立选择特定的N-酰基氨酰基；n表示1到9的整数；Y代表C1-C6二价有机基团。

  公开号：

  US20160060374A1
• 作为产物：
  描述：

  甲基丙烯酸 、 1-cyano-5-(2-chloroacetoxy)-3-oxatricyclo[4.2.1.04,8]nonan-2-one 在 potassium carbonate 、 potassium iodide 作用下， 以 N-甲基吡咯烷酮 为溶剂， 生成 1-cyano-5-(2-methacryloyloxyacetoxy)-3-oxatricyclo[4.2.1.0^4,8]nonan-2-one
  参考文献：
  名称：

  Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

  摘要：

  公开号：

  EP2105440B1

文献信息

• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140045123A1

  公开（公告）日：2014-02-13

  A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.

  一种聚合物，包括由具有支链烷基的萜酸酯单体衍生的重复单元，用于形成抗蚀组合物。在经过曝光、PEB和有机溶剂显影处理后，抗蚀组合物在溶解对比度方面得到改善。
• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。
• MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION
  申请人：Koyama Hiroshi

  公开号：US20100297555A1

  公开（公告）日：2010-11-25

  Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by following Formula (1), wherein R a represents, e.g., a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R 1 represents, e.g., a halogen atom or an alkyl or haloalkyl group having 1 to 6 carbon atoms; “A” represents an alkylene group having 1 to 6 carbon atoms, oxygen atom, sulfur atom, or nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms. The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.

  揭示了一种具有吸电子取代基和内酯骨架的单体，由以下式（1）表示，其中R代表，例如，氢原子或具有1至6个碳原子的烷基基团；R1代表，例如，卤素原子或具有1至6个碳原子的烷基或卤代烷基基团；“A”代表具有1至6个碳原子的烷基基团、氧原子、硫原子或非键合基团；“m”表示0至8的整数；Xs各自代表吸电子取代基；“n”表示1至9的整数；Y代表具有1至6个碳原子的二价有机基团。该单体通常用作高功能聚合物的单体组分，因为当该单体通常应用于抗蚀树脂时，树脂通常具有较高的稳定性和抗化学品性能，对有机溶剂具有较高的溶解性，并在水解后具有改善的水解性和/或水溶性。
• Photoresist composition
  申请人：Kamabuchi Akira

  公开号：US10377692B2

  公开（公告）日：2019-08-13

  A photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I′): wherein R51, R52, R53 and R54 independently each represent a C1-C8 alkyl group, and A11 represents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.

  一种光阻组合物，包括以下成分：由含有酸敏感基团的化合物衍生的结构单元构成的树脂，该树脂在碱性水溶液中不溶或溶解性差，但在酸的作用下变得可溶于碱性水溶液；酸发生剂；以及由下式（I'）表示的化合物：其中，R51、R52、R53和R54各自独立地表示C1-C8烷基；A11表示一个C3-C36的二价饱和环烃基，该基团可以含有一个或多个杂原子，并且可以具有一个或多个取代基，或者表示一个C6-C20的二价芳香族烃基，该基团可以含有一个或多个杂原子，并且可以具有一个或多个取代基。
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
  申请人：Takahashi Hidenori

  公开号：US20120156618A1

  公开（公告）日：2012-06-21

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)

  根据一种实施例，一种感光射线或辐射敏感的树脂组合物包括树脂（P），该树脂不仅包含至少一个重复单元（A），当暴露于感光射线或辐射时，分解从而产生酸，并由下列任一通式（I）至（III）表示，而且还包括一个重复单元（B），其中至少包含一个芳香环基团，前提是重复单元（B）不包括通式（I）至（III）中的任何一个。（通式（I）至（III）中使用的字符在描述中有所提及。）