2-Phenylpropan-2-yl 2-methylprop-2-enoate | 54554-17-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2-Phenylpropan-2-yl 2-methylprop-2-enoate
• CAS: 54554-17-5
• 化学式: C₁₃H₁₆O₂
• 分子量: 204.26
• InChiKey: PPXAHQRRLKQYTG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  15
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.31
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  Diphenylmethylsilyl methacrylate 、 2-Phenylpropan-2-yl 2-methylprop-2-enoate 、 偶氮二异丁腈 、 甲醇 以 甲苯 为溶剂， 反应 8.0h， 生成 Diphenylmethylsilyl methacrylate dimethylbenzyl methacrylate
  参考文献：
  名称：

  Resist material including si-containing resist having acid removable

  摘要：

  使用一种抗蚀材料，包括含硅丙烯酸酯的共聚物和含有酸消除基团的丙烯酸酯，并使用光酸发生剂进行辐照，形成一种精细的图案。该材料的极性在消除基团后发生变化，并变得可溶于水性碱溶液。

  公开号：

  US05856071A1

文献信息

• ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials, LLC

  公开号：US20160002199A1

  公开（公告）日：2016-01-07

  Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

  提供了一些作为光刻胶组分特别有用的酸发生剂化合物。首选的酸发生剂包括含有共价连接的酸敏感基团的环状硫铵化合物。
• IONIC COMPOUND, COMPOSITION, CURED MATERIAL, HYDROGEL AND OPHTHALMIC LENS
  申请人：Satake Kohsuke

  公开号：US20130202551A1

  公开（公告）日：2013-08-08

  An ionic compound capable of providing a cured material having superior antibacterial property and oxygen permeability, and a composition containing the ionic compound, and a cured material, a hydro gel and an ophthalmic lens which have long-term sustainable antibacterial property and superior oxygen permeability. The ionic compound is represented by the following formula (1): In formula (1), P represents a polymerizable functional group. Q + represents a cationic group: Z represents an n-valent siloxanyl group in which the total atomic weight of a group of constituent atoms is no less than 70 and no greater than 1,000; X m− represents an m-valent anion; and n is an integer of 1 to 10, where provided that n is no less than 2, a plurality of P3 and Q + 3 are each independently as defined above.

  一种离子化合物，能够提供具有优越抗菌性能和氧透性的固化材料，以及含有该离子化合物的组合物，以及具有长期可持续抗菌性能和优越氧透性的固化材料、水凝胶和眼镜片。该离子化合物由以下式（1）表示： 在式（1）中，P代表可聚合的功能基团。Q + 代表阳离子基团：Z代表一个n价硅氧烷基团，其中构成原子的总原子量不小于70且不大于1,000；X m− 代表m价阴离子；n为1至10的整数，其中n不小于2时，多个P3和Q + 3分别独立定义如上所述。
• ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160347709A1

  公开（公告）日：2016-12-01

  Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.

  提供了一些作为光刻胶组分特别有用的酸发生剂化合物。在一个首选方面，提供了包含一个或多个亲水性基团的酸发生剂。
• PHOTOBASE GENERATORS AND PHOTORESIST COMPOSITIONS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20160334703A1

  公开（公告）日：2016-11-17

  New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X 1 —R 1 —O—C(═O)N(R 2 )R 3 (I) wherein X 1 is an optionally substituted aromatic group; R 1 is a linker; and R 2 and R 3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R 2 and R 3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.

  提供了适用于光刻胶的新型光刻底物生成物，对应于式（I）：X1—R1—O—C(═O)N(R2)R3（I）其中X1是可选择取代的芳香族基团；R1是连接基团；R2和R3是相同或不同的可选择取代的线性、支链或环烷基基团或可选择取代的芳香族基团，其中R2和R3中至少有一个是具有4个或更多碳原子的可选择取代的支链烷基基团。
• COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20170059991A1

  公开（公告）日：2017-03-02

  Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):

  有机涂层组合物，特别是用于与覆盖光阻的抗反射涂层组合物，其包括包括以下化学式（I）结构的交联剂组分。