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8-hydroxy-4-oxatricyclo[5.2.1.02,6]decane-3-one | 792966-01-9

中文名称
——
中文别名
——
英文名称
8-hydroxy-4-oxatricyclo[5.2.1.02,6]decane-3-one
英文别名
8-Hydroxy-4-oxatricyclo[5.2.1.02,6]decan-3-one
8-hydroxy-4-oxatricyclo[5.2.1.0<sup>2,6</sup>]decane-3-one化学式
CAS
792966-01-9
化学式
C9H12O3
mdl
——
分子量
168.192
InChiKey
LVFWDKHHYJXPFX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.3
  • 重原子数:
    12
  • 可旋转键数:
    0
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.89
  • 拓扑面积:
    46.5
  • 氢给体数:
    1
  • 氢受体数:
    3

上下游信息

  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

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文献信息

  • ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
    申请人:Kinsho Takeshi
    公开号:US20100304295A1
    公开(公告)日:2010-12-02
    An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
    一种酸敏感酯单体具有螺环结构,其化学式如下(1),其中Z是具有可聚合双键的一价基团,X是形成环戊烷、环己烷或诺邦烷环的二价基团,R2是H或一价碳氢基团,R3和R4是H或一价碳氢基团,或者R3和R4一起表示形成环戊烷或环己烷环的二价基团,n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性,因此可以用于制备具有高分辨率的抗蚀组合物。
  • Process for producing vinyl ether compounds
    申请人:——
    公开号:US20030083529A1
    公开(公告)日:2003-05-01
    A process produces vinyl ether compounds and includes allowing a vinyl ester compound represented by following Formula (1): 1 wherein R 1 , R 2 , R 3 and R 4 are the same or different and are each a hydrogen atom or an organic group, to react with a hydroxy compound represented by following Formula (2): R 5 OH  (2) wherein R 5 is an organic group, in the presence of at least one transition element compound to thereby yield a vinyl ether compound represented by following Formula (3): 2 wherein R 2 , R 3 , R 4 and R 5 have the same meanings as defined above. Such transition element compounds include iridium compounds and other compounds containing Group VIII elements.
    该过程生产乙烯醚化合物,包括使得由以下化学式(1)表示的乙烯酯化合物发生反应:其中R1、R2、R3和R4相同或不同,每个都是氢原子或有机基团,与由以下化学式(2)表示的羟基化合物反应:其中R5是有机基团,在至少一种过渡元素化合物存在下,从而产生由以下化学式(3)表示的乙烯醚化合物:其中R2、R3、R4和R5的含义与上述定义相同。这样的过渡元素化合物包括铱化合物和其他含有第VIII族元素的化合物。
  • (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
    申请人:——
    公开号:US20040063882A1
    公开(公告)日:2004-04-01
    The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition. 1 wherein each of R 1 , R 2 , R 3 and R 4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X 1 or X 2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A 1 and A 2 represent hydrogen atoms, or A 1 and A 2 form —O—, —CH 2 — or —CH 2 CH 2 —.
    本发明的(甲基)丙烯酸酯由以下公式(1)表示。可以通过首先通过还原1,3-二烯和马来酸酐之间的Diels-Alder反应得到的加成产物来制备内酯,然后水解内酯以产生醇,随后对醇进行(甲基)丙烯化来生产(甲基)丙烯酸酯。通过共聚合包含本发明的(甲基)丙烯酸酯的单体组成物制备的聚合物在透明度,干法蚀刻抗性和有机溶剂溶解性方面表现出色,因此最好将其用作化学放大抗蚀剂组合物的树脂。其中R1、R2、R3和R4中的每一个代表氢原子、甲基基团或乙基基团;X1或X2中的任意一个代表(甲基)丙烯酰氧基,另一个代表氢原子;A1和A2均表示氢原子,或A1和A2形成-O-,-CH2-或-CH2CH2-。
  • (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern
    申请人:Kamon Yoshihiro
    公开号:US20050113538A1
    公开(公告)日:2005-05-26
    The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition. wherein each of R 1 , R 2 , R 3 and R 4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X 1 or X 2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A 1 and A 2 represent hydrogen atoms, or A 1 and A 2 form —O—, —CH 2 — or —CH 2 CH 2 —.
    本发明的(甲基)丙烯酸酯由以下公式(1)表示。可以通过首先通过还原1,3-二烯和马来酸酐之间的Diels-Alder反应得到的加成产物来生产内酯,然后使内酯水合生成醇,接着对醇进行(甲基)丙烯化来生产(甲基)丙烯酸酯。通过共聚或聚合包含本发明的(甲基)丙烯酸酯的单体组成的聚合物在透明度,干法蚀刻抵抗力和有机溶剂溶解性方面表现出色,因此最好用作化学增感抗蚀剂组成物的树脂。 其中,R1、R2、R3和R4中的每一个代表氢原子、甲基基团或乙基基团;X1或X2中的任意一个代表(甲基)丙烯酰氧基,另一个代表氢原子;A1和A2都代表氢原子,或者A1和A2形成-O-,-CH2-或-CH2CH2-。
  • Polymer for photoresist and resin compositions therefor
    申请人:——
    公开号:US20030148210A1
    公开(公告)日:2003-08-07
    A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): 1 wherein R 1 , R 2 , R 3 , R 4 and R 5 are the same or different and are each a hydrogen atom or a methyl group; m, p and q each denote an integer of from 0 to 2; and n denotes 0 or 1, where the hydroxyl group and carbonyloxy group extending from a principle chain in the formula are independently combined with either of two carbon atoms on the far-left portion of the rings. By using the polymeric compound for photoresist as a base of a photoresist, the resulting photoresist exhibits well-rounded adhesion to substrates and resistance to etching.
    本发明的光阻聚合物化合物包括至少一个由以下式(I)表示的单体单位:1其中R1、R2、R3、R4和R5相同或不同,每个都是氢原子或甲基基团;m、p和q分别表示从0到2的整数;n表示0或1,在公式中从主链延伸的羟基和羰氧基独立地与环的最左侧部分的两个碳原子中的任意一个结合。通过将光阻聚合物化合物用作光阻的基础,所得到的光阻对基板具有良好的粘附性和耐蚀性。
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