申请人:Kabushiki Kaisha Toshiba
公开号:US06060207A1
公开(公告)日:2000-05-09
A photosensitive material which is very low in absorption of a light source of short wavelength and excellent in dry etch resistance. This photosensitive material comprises a compound having a terpenoid skeleton. Preferably, the compound having a terpenoid skeleton is a compound having a monovalent menthyl group or menthyl derivative group which can be represented by the general formula (1). ##STR1## wherein R is a hydrogen atom or a monovalent hydrocarbon group, R.sup.1 may be the same with or different from each other and individually represents a hydrogen atom, a halogen atom, a hydrocarbon group, a hydroxyl group, an alkoxyl group, an amino group, an alkoxy group, an amino group, an imide group, an amide group, or a sulfonyl group, a carboxyl group, a carbonyl group, or a sulfonamide group, and a pair of neighboring R.sup.1 may be connected together to form a closed ring.
一种光敏材料,对短波长光源的吸收非常低,并且具有出色的干法蚀刻抗性。该光敏材料包括具有萜类骨架的化合物。最好,具有萜类骨架的化合物是具有单价薄荷基或薄荷衍生基的化合物,可以用一般式(1)表示。其中,R是氢原子或单价的碳氢基团,R.sup.1可以相同或不同,分别表示氢原子、卤素原子、碳氢基团、羟基、烷氧基、氨基、烷氧基、酰亚胺基、酰胺基、磺酰基、羧基、酰基或磺酰胺基,相邻的一对R.sup.1可以连接在一起形成闭环。