An object of the present invention is to provide a window member (12) for chemical mechanical polishing, which is excellent in antifouling property and transparency and is excellent in anti-scratching and, further, can easily perform detection of a polishing endpoint of the surface of a semiconductor wafer (4) by passing a light for endpoint detection, in polishing of a semiconductor wafer (4) using an optical endpoint detecting apparatus (6) and also to a polishing pad (1). A window member (12) for chemical mechanical polishing of the present invention is provided with a substrate part (12a) (comprised of polyurethane resin and the like), which is transparent partly at least, an antifouling resin layer (12b) formed on at least one side of the substrate part (12a). This antifouling resin layer (12b) is preferably comprised of a fluorine-based polymer having a polysiloxane segment in a main chain.
本发明的目的是提供一种
化学机械抛光用窗口构件(12),该构件具有优异的防污性能和透明性,并且具有优异的防刮伤性能,此外,在使用光学端点检测装置(6)对半导体晶片(4)进行抛光时,还可以通过端点检测用光轻松地对半导体晶片(4)表面的抛光端点进行检测,同时还可以对抛光垫(1)进行检测。本发明用于
化学机械抛光的窗口部件(12)具有一个至少部分透明的基底部分(12a)(由聚
氨酯
树脂等组成),在基底部分(12a)的至少一侧形成防污
树脂层(12b)。该防污
树脂层(12b)最好由主链中含有聚
硅氧烷段的
氟基聚合物组成。