A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same are disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB(Post Exposure Baking) temperature sensitivity.
本发明公开了一种具有
螺环酮基的光致抗蚀剂聚合物和一种包括该聚合物的光致抗蚀剂组合物。这种光刻胶聚合物和光刻胶组合物由于螺环
缩酮基脱保护反应的活化能低,因此可以提高分辨率和加工余量,并且由于其较低的 PEB(曝光后烘烤)温度敏感性,可以产生精细的光刻胶图案。