CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:SHINACHI Satoshi
公开号:US20090274984A1
公开(公告)日:2009-11-05
Carboxyl-containing lactone compounds having formula (1) are novel wherein R
1
is H, F, methyl or trifluoromethyl, R
2
and R
3
are H or monovalent hydrocarbon groups, or R
2
and R
3
may together form an aliphatic ring, W is CH
2
, O or S, k
1
is an integer of 0 to 4, and k
2
is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.
具有式(1)的含羧基内酯化合物是新型的,其中R1为H、F、甲基或三氟甲基,R2和R3为H或一价碳氢基团,或者R2和R3可以共同形成脂肪环,W为CH2、O或S,k1为0到4的整数,k2为0或1。它们可用作单体,生产透射辐射≦500nm的聚合物。以这些聚合物为基础树脂的辐射敏感抗蚀剂组合物具有优异的性能,包括分辨率、LER、图案密度依赖性和曝光余量。