ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:Kinsho Takeshi
公开号:US20100304295A1
公开(公告)日:2010-12-02
An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R
2
is H or monovalent hydrocarbon, R
3
and R
4
are H or monovalent hydrocarbon, or R
3
and R
4
, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
Ester compounds, polymers, resist compositions and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US06312867B1
公开(公告)日:2001-11-06
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.