6-Hydroxy-3-sec.butyl-acetophenon | 84942-39-2

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 6-Hydroxy-3-sec.butyl-acetophenon
• 英文别名: 1-[5-(Butan-2-yl)-2-hydroxyphenyl]ethan-1-one；1-(5-butan-2-yl-2-hydroxyphenyl)ethanone
• CAS: 84942-39-2
• 化学式: C₁₂H₁₆O₂
• mdl: MFCD24389231
• 分子量: 192.258
• InChiKey: PAHAZPFBJGYIHV-UHFFFAOYSA-N

物化性质

• 沸点：
  115-119 °C(Press: 3 Torr)
• 密度：
  1.033±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  14
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.416
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  6-Hydroxy-3-sec.butyl-acetophenon 在 硝酸 作用下， 以 溶剂黄146 为溶剂， 反应 2.5h， 以89%的产率得到1-(5-sec-Butyl-2-hydroxy-3-nitro-phenyl)-ethanone
  参考文献：
  名称：

  Über 4,6-disubstituierte 2-Aminophenole

  摘要：

  DOI：

  10.1055/s-1982-30007
• 作为产物：
  描述：

  4-(sec-butyl)phenyl acetate 在 三氯化铝 作用下， 以84%的产率得到6-Hydroxy-3-sec.butyl-acetophenon
  参考文献：
  名称：

  Über 4,6-disubstituierte 2-Aminophenole

  摘要：

  DOI：

  10.1055/s-1982-30007

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280675A1

  公开（公告）日：2016-09-29

  The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

  感光树脂或辐射敏感树脂组合物包括具有极性转换基团和可溶于碱性树脂的交联剂，其中极性转换基团是一种能够通过碱性水溶液作用分解并在具有交联基团的侧面生成羧酸或磺酸的基团。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
  申请人：FUJIFILM CORPORATION

  公开号：US20150010855A1

  公开（公告）日：2015-01-08

  There is provided an actinic ray-sensitive or radiation-sensitive composition containing (α) a compound represented by the formula (αI) capable of generating an acid having a size of 200 Å 3 or more in volume and (β) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (αI) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive composition, a resist-coated mask blanks coated with the resist film, a resist pattern forming method comprising exposing the resist film and developing the exposed film, a photomask obtained by exposing and developing the resist-coated mask blanks, a method for manufacturing an electronic device, comprising the resist pattern forming method and an electronic device manufactured by the manufacturing method of an electronic device.

  提供一种感光或辐射敏感的组合物，其中包含(α)一种化合物，其由公式(αI)表示，能够产生大小为200Å3或更大的体积的酸，以及(β)一种化合物，能够在受到光辐射或辐射时产生酸，公式(αI)的定义如本文所述。还提供了使用该感光或辐射敏感组合物形成的光阻膜，涂有光阻膜的光阻涂层掩模坯料，包括曝光光阻膜和显影曝光后膜的光阻图案形成方法，通过曝光和显影涂有光阻涂层的掩模坯料获得的光掩模，以及一种电子器件的制造方法，包括光阻图案形成方法和制造电子器件的电子器件制造方法，以及通过该电子器件制造方法制造的电子器件。
• Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound
  申请人：FUJIFILM Corporation

  公开号：US10011576B2

  公开（公告）日：2018-07-03

  The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

  光敏或辐射敏感树脂组合物包括具有极性转换基团的交联剂和碱溶性树脂，其中极性转换基团是能够在碱性水溶液作用下分解的基团，在具有交联基团的一侧生成羧酸或磺酸。
• BURDESKA, K., SYNTHESIS, BRD, 1982, N 11, 940-942
  作者：BURDESKA, K.

  DOI：——

  日期：——
• CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
  申请人：TSUCHIMURA Tomotaka

  公开号：US20130029254A1

  公开（公告）日：2013-01-31

  A chemical amplification resist composition contains: (A) a polymer compound having a phenolic hydroxyl group and a group formed by substituting a substituent for a hydrogen atom of a hydroxyl group in a phenolic hydroxyl group and satisfying the following (a) to (c) at the same time: (a) the polydispersity is 1.2 or less, (b) the weight average molecular weight is from 2,000 to 6,500, and (c) the glass transition temperature (Tg) is 140° C. or more.