3,5-Methano-2H-cyclopenta[b]furan-2-one, 3,3a,4,5,6,6a-hexahydro-7-syn-(hydroxymethyl)-, (3R,3a-trans,5-cis,6a-trans)-

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 3,5-Methano-2H-cyclopenta[b]furan-2-one, 3,3a,4,5,6,6a-hexahydro-7-syn-(hydroxymethyl)-, (3R,3a-trans,5-cis,6a-trans)-
• 英文别名: 9-(hydroxymethyl)-4-oxatricyclo[4.2.1.03,7]nonan-5-one
• 化学式: C₉H₁₂O₃
• 分子量: 168.19
• InChiKey: PLQZGYNJIGZRKY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  12
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  3,5-Methano-2H-cyclopenta[b]furan-2-one, 3,3a,4,5,6,6a-hexahydro-7-syn-(hydroxymethyl)-, (3R,3a-trans,5-cis,6a-trans)- 生成 (-)-(1R,2R,4R,5S,6S)-5-(Hydroxymethyl)-8-oxatricyclo<4.2.1.0^2,6>nonan-7-one
  参考文献：
  名称：

  JANSSEN, A. J. M.;KLUNDER, A. J. H.;ZWANENBURG, B., TETRAHEDRON, 47,(1991) N9, C. 5513-5538

  摘要：

  DOI：
• 作为产物：
  描述：

  (5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-9-yl)methyl acetate 、 (+)-(1R,2S,4R,5S,6R,9R)-5-(Hydroxymethyl)-9-iodo-8-oxatricyclo<4.2.1.0^2,6>nonan-7-one 以100%的产率得到
  参考文献：
  名称：

  JANSSEN, A. J. M.;KLUNDER, A. J. H.;ZWANENBURG, B., TETRAHEDRON, 47,(1991) N9, C. 5513-5538

  摘要：

  DOI：

文献信息

• ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Kinsho Takeshi

  公开号：US20100304295A1

  公开（公告）日：2010-12-02

  An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.

  一种酸敏感酯单体具有螺环结构，其化学式如下（1），其中Z是具有可聚合双键的一价基团，X是形成环戊烷、环己烷或诺邦烷环的二价基团，R2是H或一价碳氢基团，R3和R4是H或一价碳氢基团，或者R3和R4一起表示形成环戊烷或环己烷环的二价基团，n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性，因此可以用于制备具有高分辨率的抗蚀组合物。
• US8791288B2
  申请人：——

  公开号：US8791288B2

  公开（公告）日：2014-07-29
• [EN] POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD<br/>[FR] COMPOSITION DE RÉSIST POSITIF POUR EXPOSITION PAR IMMERSION ET PROCÉDÉ DE FORMATION DE MOTIF
  申请人：FUJIFILM CORP

  公开号：WO2010035894A1

  公开（公告）日：2010-04-01

  A positive resist composition for immersion exposure includes the following (A) to (D): (A) a resin capable of decomposing by an action of an acid to increase a solubility of the resin in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a resin having at least either one of a fluorine atom and a silicon atom; and (D) a mixed solvent containing at least one kind of a solvent selected from the group consisting of solvents represented by any one of the following formulae (S1) to (S3) as defined in the specification, in which a total amount of the at least one kind of the solvent is from 3 to 20 mass% based on all solvents of the mixed solvent (D).
• JANSSEN, A. J. M.;KLUNDER, A. J. H.;ZWANENBURG, B., TETRAHEDRON, 47,(1991) N9, C. 5513-5538
  作者：JANSSEN, A. J. M.、KLUNDER, A. J. H.、ZWANENBURG, B.

  DOI：——

  日期：——