Hexahydro-2,6-methanooxireno[f][2]benzofuran-3,5-dione | 6004-80-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: Hexahydro-2,6-methanooxireno[f][2]benzofuran-3,5-dione
• 英文别名: 4,9-dioxatetracyclo[5.3.1.02,6.08,10]undecane-3,5-dione
• CAS: 6004-80-4
• 化学式: C₉H₈O₄
• 分子量: 180.16
• InChiKey: UUWMOJSMSOVYSY-UHFFFAOYSA-N

物化性质

• 沸点：
  389.2±35.0 °C(Predicted)
• 密度：
  1.590±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -0.2
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  55.9
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  Hexahydro-2,6-methanooxireno[f][2]benzofuran-3,5-dione 以11%的产率得到
  参考文献：
  名称：

  Aitken R. Alan, Cadogan J. I. G., Gosney Ian, J. Chem. Soc. Perkin Trans. 1, (1994) N 8, S 927-931

  摘要：

  DOI：
• 作为产物：
  描述：

  纳迪克酸酐 、 苯-1,2-二过氧甲酸 生成 Hexahydro-2,6-methanooxireno[f][2]benzofuran-3,5-dione
  参考文献：
  名称：

  DRYUK, V. G.;RYBINTSEVA, E. M.;KORCHAGINA, A. M.;KRIVOSHEEVA, N. G., VOPR. XIMII I XIM. TEXNOL.,(1989) N1, S. 40-45

  摘要：

  DOI：

文献信息

• (Meth)acrylate compound, photosensitive polymer, and resist composition
  申请人：Lee Sung-Jae

  公开号：US20110045405A1

  公开（公告）日：2011-02-24

  Disclosed are a (meth)acrylate compound, a photosensitive polymer, and a resist composition, and the (meth)acrylate compound includes a lactone-group-containing (meth)acrylate compound represented by the following Chemical Formula 1.

  本发明涉及一种（甲基）丙烯酸酯化合物、一种光敏聚合物和一种抗蚀组合物，其中（甲基）丙烯酸酯化合物包括下述化学式1所表示的含有内酯基的（甲基）丙烯酸酯化合物。
• DRYUK, V. G.;RYBINTSEVA, E. M.;KORCHAGINA, A. M.;KRIVOSHEEVA, N. G., VOPR. XIMII I XIM. TEXNOL.,(1989) N1, S. 40-45
  作者：DRYUK, V. G.、RYBINTSEVA, E. M.、KORCHAGINA, A. M.、KRIVOSHEEVA, N. G.

  DOI：——

  日期：——
• Aitken R. Alan, Cadogan J. I. G., Gosney Ian, J. Chem. Soc. Perkin Trans. 1, (1994) N 8, S 927-931
  作者：Aitken R. Alan, Cadogan J. I. G., Gosney Ian

  DOI：——

  日期：——
• POLYIMIDE PRECURSOR MODIFIED WITH DICARBOXYLIC ACID ANHYDRIDE, IMIDIZED POLYIMIDE AND LIQUID CRYSTAL ALIGNING AGENT USING IT
  申请人：Suzuki Hideo

  公开号：US20140066590A1

  公开（公告）日：2014-03-06

  To provide a polyimide precursor and/or polyimide which has an excellent solubility in various organic solvents, and with which a liquid crystal alignment film can be obtained which is excellent in a rubbing resistance and which is hardly deteriorated even by irradiation with backlight. A polyimide precursor having its terminal amino group modified with at least one alicyclic epoxydicarboxylic acid anhydride selected from the group consisting of compounds of the formulae [1] and [2], or a polyimide obtained by imidizing it: wherein Y is a C 1-2 alkylene or an oxygen atom, and R 1 is a hydrogen atom or an organic group represented by —X 1 —X 2 —X 3 , wherein X 1 is a single bond or —CH 2 —, X 2 is a single bond or -0-, and X 3 is a C 1-20 alkyl group, a C 1-20 haloalkyl group or a C 1-20 alkyl group containing a cyano group.
• SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170153549A1

  公开（公告）日：2017-06-01

  A resist underlayer film-forming composition for lithography having an aliphatic polycyclic structure including, as a silane, a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a combination thereof, in which the aliphatic polycyclic structure is a structure which a hydrolyzable silane of Formula (1): R 1 a R 2 b Si(R 3 ) 4−(a+b) Formula (1) (where R 1 is an organic group having an aliphatic polycyclic structure and bonded to a Si atom through a Si—C bond; R 3 is an ethoxy group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3) has, or a structure included in a compound added as an aliphatic polycyclic compound, an aliphatic polycyclic dicarboxylic acid, or an aliphatic polycyclic dicarboxylic acid anhydride, each optionally having a double bond, a hydroxy group, or an epoxy group.