八氢-4,7-甲桥-1H-茚-2-羧酸 | 40252-86-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 中文名称: 八氢-4,7-甲桥-1H-茚-2-羧酸
• 英文名称: 2,5-Methylen-bicyclo<0.3.4>nonan-carbonsaeure-(8)
• 英文别名: octahydro-4,7-methano-indene-2-carboxylic acid；Octahydro-4,7-methano-inden-2-carbonsaeure；Octahydro-4,7-methano-1H-indene-2-carboxylic acid；tricyclo[5.2.1.02,6]decane-4-carboxylic acid
• CAS: 40252-86-6
• 化学式: C₁₁H₁₆O₂
• 分子量: 180.247
• InChiKey: RDARSNURXMFGDV-UHFFFAOYSA-N

物化性质

• 沸点：
  297.1±8.0 °C(Predicted)
• 密度：
  1.188±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  13
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

安全信息

• 海关编码：
  2916190090

反应信息

• 作为反应物：
  描述：

  八氢-4,7-甲桥-1H-茚-2-羧酸 生成 Octahydro-4,7-methano-indene-2-carboxylic acid amide
  参考文献：
  名称：

  2-巯基乙am为胃抗分泌剂。

  摘要：

  合成了一系列的N-取代的2-巯基乙am，并评价了用胃泌素四肽刺激的狗的胃抗分泌活性。口服剂量为8 mg / kg后，最有效的类似物显示出80--95％的酸分泌抑制作用。因此，这些化合物代表具有显着抗分泌活性的新结构类型。二硫化物与相应的巯基乙acet具有基本相同的抗分泌能力，表明代谢相互转化。巯基的烷基化降低了效力。较高的羧am同系物，例如2-和3-巯基丙ion，具有非常低的活性。羟乙am和巯基乙酰胺的药效也很低。用这一系列化合物观察到的副作用包括呕吐，心动过速和胃出血。

  DOI：

  10.1021/jm00189a015
• 作为产物：
  描述：

  Diammonal 在 cobalt(II) acetate 氧气 作用下， 生成 八氢-4,7-甲桥-1H-茚-2-羧酸
  参考文献：
  名称：

  Hock,H.; Kropf,H., Journal fur praktische Chemie (Leipzig 1954), 1961, vol. 14, p. 71 - 83

  摘要：

  DOI：

文献信息

• (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：Maeda Katsumi

  公开号：US20070218403A1

  公开（公告）日：2007-09-20

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用220纳米或以下光的光阻材料，包括至少一种由以下式子（2）表示的聚合物和用于曝光生成酸的光酸发生剂： 其中，R1、R2、R3和R5分别是氢原子或甲基基团；R4是酸敏感基团、具有7至13个碳原子的脂环烃基团、具有酸敏感基团的7至13个碳原子的脂环烃基团、具有3至13个碳原子的环烃基团、具有环氧基团；R6是氢原子、具有1至12个碳原子的碳氢基团或具有7至13个碳原子的脂环烃基团，具有羧基；x、y和z是可选值，满足x+y+z=1，0
• (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT
  申请人：Maeda Katsumi

  公开号：US20110196122A1

  公开（公告）日：2011-08-11

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用于220nm或更低波长的光的光阻材料，其包括至少由以下化学式(2)表示的聚合物和用于曝光后生成酸的光酸发生剂：其中，R1、R2、R3和R5分别为氢原子或甲基基团；R4为酸敏感基团、具有7至13个碳原子的脂环烃基团，其具有酸敏感基团、具有7至13个碳原子的脂环烃基团，其具有羧基基团，或具有3至13个碳原子的碳氢基团，其具有环氧基团；R6为氢原子、具有1至12个碳原子的碳氢基团，或具有7至13个碳原子的脂环烃基团，其具有羧基基团；x、y和z是可选值，满足x+y+z=1，0
• Liquid, curable coating composition based on a hydroxyl groups-containing addition polymer as binder
  申请人：AKZO N.V.

  公开号：EP0171847B1

  公开（公告）日：1988-06-01
• NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME
  申请人：Hoshino Wataru

  公开号：US20100203445A1

  公开（公告）日：2010-08-12

  An object of the present invention is to solve the technical task of enhancing the performance in micro-photofabrication using far ultraviolet light, particularly ArF excimer laser at a wavelength of 193 nm, and more specifically, provide a negative resist composition hardly allowing occurrence of pattern collapse and exhibiting good resolution even in the formation of a fine pattern, and a resist pattern forming method using the composition, which are a negative resist composition comprising (A) an alkali-soluble resin, (B) a compound that contains a low molecular compound having a molecular weight of 2,000 or less and having an oxetane structure, and (C) a cationic photopolymerization initiator, and a resist pattern forming method using the composition.
• Immersion oils having long service life
  申请人：Carl Zeiss Jena GmbH

  公开号：US20210302712A1

  公开（公告）日：2021-09-30

  An immersion oil for microscopy contains a) a first diester A1 based on a tricyclodecane radical K having one functional group and a first hydrocarbon derivative C1 having two functional groups, and b) a second diester A2 based on the tricyclodecane radical K having one functional group and a second hydrocarbon derivative C2 having two functional groups, where C1 and C2 are different. Methods can be used for the production of the immersion oil and for the use thereof in microscopy.