4,5-二羟基-1,3-二(甲氧基甲基)-2-咪唑啉二酮 | 3001-61-4

• 物质功能分类: 有机原料 - 杂环化合物
• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑烷类
• 中文名称: 4,5-二羟基-1,3-二(甲氧基甲基)-2-咪唑啉二酮
• 英文名称: 4,5-Dihydroxy-1,3-bis(methoxymethyl)imidazolidin-2-one
• CAS: 3001-61-4
• 化学式: C₇H₁₄N₂O₅
• 分子量: 206.2
• InChiKey: LATROIIBXZFCTH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.6
• 重原子数：
  14
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  82.5
• 氢给体数：
  2
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  1,1'-Methylenebis(3-methoxymethyl-4,5-dihydroxyimidazolidin-2-one) 、 1,1'-亚甲基二[4,5-二羟基-3-(2-羟基乙基)-2-咪唑烷酮] 、 4,5-二羟基-1,3-二(甲氧基甲基)-2-咪唑啉二酮 生成 1,1'-Methylenebis(3-hydroxymethyl-4,5-dihydroxyimidazolidin-2-one)
  参考文献：
  名称：

  Method of adhesion of rubber to reinforcing materials

  摘要：

  一种将橡胶粘合到增强材料的方法，包括将纺织纤维或金属增强材料嵌入硫化橡胶组合物中，该组合物包括橡胶、硫化剂和咪唑啉酮，并将该组合物硫化。

  公开号：

  US04300973A1

文献信息

• FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-ACID GENERATORS
  申请人：International Business Machines Corporation

  公开号：US20180046077A1

  公开（公告）日：2018-02-15

  Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group having a perfluorinated substituent alpha to the ketone carbonyl. The non-polymeric PAGs release a sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs can also undergo a thermal reaction to form a sulfonic acid. The perfluorinated substituent provides improved thermal stability and hydrolytic/nucleophilic stability.

  非离子型光生酸(PAG)化合物被制备出来，它们含有一个含有全氟取代基的芳酮基团，该取代基位于酮羰基的α位置。这些非聚合PAGs在暴露于高能辐射，如深紫外或极紫外光时，会释放出磺酸。在100°C至150°C的后曝光烘烤(PEB)下，光生成的磺酸在暴露的抵抗层中具有较低的扩散速率，从而在开发后形成良好的线条图案。在较高温度下，PAGs也可以通过热反应形成磺酸。全氟取代基提供了改善的热稳定性和水解/亲核稳定性。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS
  申请人：International Business Machines Corporation

  公开号：US20180044459A1

  公开（公告）日：2018-02-15

  Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.

  制备了含有α-羟基芳基酮的侧链磺酸酯的非离子光酸发生（PAG）可聚合单体。芳基酮基团在酮基团的α位有全氟取代基。磺酸酯的硫也直接连接到氟化基团。从这些PAG单体制备的PAG聚合物在暴露于高能辐射（如深紫外或极紫外光）时释放出强磺酸。在经过后曝光烘烤（PEB）处理（100°C至150°C）的暴露光刻胶层中，光生成的磺酸扩散速率较低，结果在显影后形成良好的线型图案。
• Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same
  申请人：Central Glass Company, Limited

  公开号：US20150198879A1

  公开（公告）日：2015-07-16

  Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R 01 represents a hydrogen atom or a monovalent organic group, and M + represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

  本公开了一种含氟磺酸盐树脂，其具有以下通用式（3）所代表的重复单元。在该式中，每个A独立地表示氢原子、氟原子或三氟甲基基团，n表示1-10的整数。W表示二价连接基团，R01表示氢原子或一价有机基团，M+表示一价阳离子。含有该树脂的抗蚀组合物在感光性、分辨率和掩膜图案的重现性方面更加优越，并且能够形成具有较低LER的图案。