6-hydroxy-3,5-methanocyclopentatetrahydrofuran | 827607-29-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 6-hydroxy-3,5-methanocyclopentatetrahydrofuran
• 英文别名: 4-oxatricyclo[4.2.1.03,7]nonan-2-ol
• CAS: 827607-29-4
• 化学式: C₈H₁₂O₂
• 分子量: 140.182
• InChiKey: MWUWGUJEZSPUSM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  29.5
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  6-hydroxy-3,5-methanocyclopentatetrahydrofuran 生成 Hexahydro-6H-3,5-methanocyclopenta[b]furan-6-one
  参考文献：
  名称：

  IKUMA, SYUN;SUGIEH, AKIXIKO;KATSUBEH, DZYUNKI;SITAMURA, KOKI

  摘要：

  DOI：
• 作为产物：
  描述：

  4-oxatricyclo[4.2.1.03,7]nonan-2-yl acetate 生成 6-hydroxy-3,5-methanocyclopentatetrahydrofuran
  参考文献：
  名称：

  IKUMA, SYUN;SUGIEH, AKIXIKO;KATSUBEH, DZYUNKI;SITAMURA, KOKI

  摘要：

  DOI：

文献信息

• Novel compound, polymer, resist composition, and patterning process
  申请人：Hasegawa Koji

  公开号：US20050014092A1

  公开（公告）日：2005-01-20

  There is disclosed a polymer containing at least a repeating unit represented by the following general formula (1), and the resist composition containing the polymer as a base resin, especially a chemically amplified resist composition. There can be provided a resist composition which has etching resistance in a practical use level, and is excellent in an adhesion property with a substrate and an affinity with a developer, and has a sensitivity and resolving power which is far excellent compared with a conventional one, wherein swelling is small at the time of development, especially for photolithography which uses a high-energy beam as a light source, and especially be provided a chemically amplified resist composition.

  本发明公开了一种聚合物，其至少包含由下述通式（1）表示的重复单元，并且该聚合物作为基础树脂含于抗蚀剂组成物中，特别是化学增感抗蚀剂组成物中。本发明可提供一种在实际使用水平上具有蚀刻抗性、与基板具有优异的粘附性和与显影剂具有亲和性，并且具有远优于传统抗蚀剂的感度和分辨率的抗蚀剂组成物，在开发时膨胀小，特别适用于使用高能光束作为光源的光刻技术，特别是化学增感抗蚀剂组成物。
• Compound, polymer, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US07169541B2

  公开（公告）日：2007-01-30

  There is disclosed a polymer containing at least a repeating unit represented by the following general formula (1), and the resist composition containing the polymer as a base resin, especially a chemically amplified resist composition. There can be provided a resist composition which has etching resistance in a practical use level, and is excellent in an adhesion property with a substrate and an affinity with a developer, and has a sensitivity and resolving power which is far excellent compared with a conventional one, wherein swelling is small at the time of development, especially for photolithography which uses a high-energy beam as a light source, and especially be provided a chemically amplified resist composition

  本发明公开了一种聚合物，其中至少包含由以下一般式（1）表示的重复单元，并且该聚合物作为基础树脂包含在抗蚀剂组合物中，特别是化学增感抗蚀剂组合物。可以提供一种抗蚀剂组合物，其在实际使用水平上具有蚀刻抗性，并且在与基板的附着性和与显影剂的亲和性方面表现出色，并且具有远比传统抗蚀剂组合物优异的灵敏度和分辨率，其中在显影时膨胀较小，特别适用于使用高能光束作为光源的光刻技术，特别是提供一种化学增感抗蚀剂组合物。
• Optically active diphosphines, intermediates thereof, and processes for production thereof
  申请人：MITSUI TOATSU CHEMICALS, Inc.

  公开号：EP0530015A1

  公开（公告）日：1993-03-03

  An optically active diphosphine having a bicyclo[2.2.1]heptane of the formula where R¹, R², R³ and R⁴ are defined in the specification, intermediates thereof and a metal complex comprising said optically active diphosphine are disclosed. A process for producing or purifying said optically active diphosphine is disclosed.

  一种光学活性二膦，其双环[2.2.1]庚烷的化学式为 其中 R¹、R²、R³ 和 R⁴ 在说明书中定义，本发明公开了其中间体和包含所述光学活性二膦的金属络合物。本发明还公开了一种生产或提纯所述光学活性二膦的工艺。
• Kas'yan, L. I.; Zefirov, N. S.; Gnedenkov, L. Yu., Journal of Organic Chemistry USSR (English Translation), 1982, p. 1047 - 1051
  作者：Kas'yan, L. I.、Zefirov, N. S.、Gnedenkov, L. Yu.、Stepanova, N. V.、Shashkov, A. S.、Cherepanova, E. G.

  DOI：——

  日期：——
• IKUMA, SYUN;SUGIEH, AKIXIKO;KATSUBEH, DZYUNKI;SITAMURA, KOKI
  作者：IKUMA, SYUN、SUGIEH, AKIXIKO、KATSUBEH, DZYUNKI、SITAMURA, KOKI

  DOI：——

  日期：——