RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:US20160145231A1
公开(公告)日:2016-05-26
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
Expeditious and benign methods for primary alcohol–carboxylic acid conversions with TEMPO were developed in a biphasic system composed of a slightly miscible ether (THP) and aqueous layer. Easily available co-oxidants such as Py·HBr3, Bu4NBr3, and electrooxidation were successfully applied to generate N-oxoammonium species as a recyclable catalyst.
Practical Intermolecular Hydroarylation of Diverse Alkenes via Reductive Heck Coupling
作者:John A. Gurak、Keary M. Engle
DOI:10.1021/acscatal.8b02717
日期:2018.10.5
hydroarylation of alkenes is an attractive approach to construct carbon–carbon (C–C) bonds from abundant and structurally diverse starting materials. Herein we report a palladium-catalyzed reductive Heck hydroarylation of aliphatic and heteroatom-substituted terminal alkenes and select internal alkenes with an array of (hetero)aryl iodides. The reaction is anti-Markovnikov selective with terminal alkenes and tolerates
A radiation-sensitive composition containing a resist compound A, an acid generator B, and an acid crosslinking agent C. The resist compound A is (a) a polyphenol compound which is produced by the condensation of a C5-45 aromatic ketone or aromatic aldehyde with a C6-15 compound having from 1 to 3 phenolic hydroxyl groups, and, (b) its molecular weight is form 300 to 5000. The radiation-sensitive composition is solvent-soluble and exhibits a high sensitivity, high resolution, and high heat resistance.