A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.
一种形成图案的方法包括:(i) 使用一种含有(A)一种能够在受到光或辐射照射时生成酸并通过酸的作用分解以降低该化合物(A)对有机溶剂的溶解度的光敏或辐射敏感
树脂组合物形成薄膜;(ii) 曝光薄膜;和(iii) 使用含有有机溶剂的显影剂进行显影。