1-cyclooctylethanol | 52830-00-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-cyclooctylethanol
• 英文别名: 1-cyclooctyl-ethanol；(+/-)-(1-Hydroxy-aethyl)-cyclooctan；1-Cyclooctyl-aethanol
• CAS: 52830-00-9
• 化学式: C₁₀H₂₀O
• 分子量: 156.268
• InChiKey: WHHQHKXZNKPFKM-UHFFFAOYSA-N

物化性质

• 沸点：
  238.9±8.0 °C(Predicted)
• 密度：
  0.892±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1-cyclooctylethanol 在 吡啶 、 potassium dichromate 、 硫酸 作用下， 以 丙酮 为溶剂， 反应 5.0h， 生成 Cyclooctylmethylketoxim-pikrat
  参考文献：
  名称：

  Langhals, Heinz; Ruechardt, Christoph, Chemische Berichte, 1981, vol. 114, # 12, p. 3831 - 3854

  摘要：

  DOI：
• 作为产物：
  描述：

  环辛醇 在 氯化亚砜 作用下， 以 氯仿 为溶剂， 生成 1-cyclooctylethanol
  参考文献：
  名称：

  Taskinen,E., Acta chemica Scandinavica. Series B: Organic chemistry and biochemistry, 1974, vol. B 28, p. 357 - 366

  摘要：

  DOI：

文献信息

• H-Bonding-promoted radical addition of simple alcohols to unactivated alkenes
  作者：Yunfei Tian、Zhong-Quan Liu

  DOI：10.1039/c7gc02540h

  日期：——

  An H-bonding-induced radical addition of simple alcohols to unactivated olefins was achieved. It effectively solved the long-standing problems of reactivity and selectivity in this type of reactions. The hydroxyalkylation occurred via site-specific cleavage of the α-hydroxyl-C-H bond in alcohols. This method allows a highly atom-economic, operationally simple and environmentally benign access to diverse

  实现了由H键诱导的简单醇向未活化烯烃的自由基加成反应。它有效地解决了这类反应中长期存在的反应性和选择性问题。羟烷基化通过醇中α-羟基-CH键的位点特异性裂解而发生。该方法允许以原子经济，操作简单和环境友好的方式获得各种伯，仲和叔醇，二醇，甚至多氟化醇。这些有用的化学药品传统上是通过复杂的操作通过使用商业上无法获得的有机金属来合成的。相比之下，可以通过该协议使用广泛使用的起始原料轻松获得它们。
• Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method
  申请人：Mori Kazunori

  公开号：US20120077126A1

  公开（公告）日：2012-03-29

  A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R 1 represents a polymerizable double bond-containing group; R 2 represents a fluorine atom or a fluorine-containing alkyl group; R 8 represents a substituted or unsubstituted alkyl group or the like; and W 1 represents a single bond, a substituted or unsubstituted methylene group or the like.

  本发明的含氟聚合物包含通式（2）的重复单元（a），其具有1,000至1,000,000的质量平均分子量。该聚合物适用于抗高能辐射（波长小于或等于300nm的高能射线辐射或电子束辐射）的光阻组合物，或用于液体浸没光刻的面涂层组合物，并具有高水珠性，尤其是高后退接触角。在公式中，R1表示可聚合的双键含有的基团；R2表示氟原子或含氟烷基；R8表示取代或未取代的烷基或类似物；W1表示单键，取代或未取代的亚甲基或类似物。
• POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
  申请人：Masunaga Keiichi

  公开号：US20110212391A1

  公开（公告）日：2011-09-01

  A polymer comprising recurring units having a fluorinated carboxylic acid onium salt structure on a side chain is used to formulate a chemically amplified positive resist composition. When the composition is processed by lithography to form a positive pattern, the diffusion of acid in the resist film is uniform and slow, and the pattern is improved in LER.

  使用含有氟化羧基离子盐结构的重复单元的聚合物作为侧链，用于配制化学增感正型光刻胶组分。当该组分通过光刻工艺形成正型图案时，胶膜中的酸扩散均匀缓慢，从而改善LER。
• CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Masunaga Keiichi

  公开号：US20110212390A1

  公开（公告）日：2011-09-01

  A chemically amplified negative resist composition is provided comprising (A) an alkali-soluble base polymer, (B) an acid generator, and (C) a nitrogen-containing compound, the base polymer (A) turning alkali insoluble under the catalysis of acid. A polymer having a fluorinated carboxylic acid onium salt on a side chain is included as the base polymer. Processing the negative resist composition by a lithography process may form a resist pattern with advantages including uniform low diffusion of acid, improved LER, and reduced substrate poisoning.

  提供了一种化学放大负型光刻胶组合物，包括（A）一种可溶于碱性溶液的基础聚合物，（B）一种酸发生剂，和（C）一种含氮化合物，基础聚合物（A）在酸的催化下变为碱不溶性。在侧链上含有氟化羧酸亚烷基盐的聚合物被包括在基础聚合物中。通过光刻工艺处理负型光刻胶组合物可以形成具有以下优点的光刻图案：酸的扩散均匀低、LER改善和减少衬底污染。
• Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same
  申请人：Mori Kazunori

  公开号：US20110318542A1

  公开（公告）日：2011-12-29

  There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R 1 represents a polymerizable double bond-containing group; R 2 represents a fluorine atom or a fluorine-containing alkyl group; R 3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W 1 represents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.

  本发明公开了一种含氟聚合物化合物，其包括下述通式（2）的重复单元（a），并且具有1000至1000000的重均分子量，其中R1表示聚合双键含有基团；R2表示氟原子或含氟烷基；R3表示氢原子、酸敏基团、交联位点或其他一价有机基团；W1表示连接基。当将该含氟聚合物化合物用于300纳米或更短波长的高能辐射或电子束辐射的图案形成的光阻化合物中时，可以形成具有良好矩形轮廓的光阻图案。