Resist composition, method of forming resist pattern, novel compound and acid generator
申请人:Kawaue Akiya
公开号:US20100196820A1
公开(公告)日:2010-08-05
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R
5
represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q
5
represents a single bond or a divalent linking group).
The minute amount of hydrogen sulfate groups introduced into the grapheneoxide (GO) obtained by Hummers oxidation of graphite renders this material as a highly efficient, recyclable acid catalyst for the ringopening of epoxides with methanol and other primary alcohols as nucleophile and solvent.
The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.